Issued Patents All Time
Showing 1–25 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6939926 | Phenol novolak resin, production process thereof, and positive photoresist composition using the same | Ken Miyagi, Yasuhide Ohuchi, Atsuko Hirata, Kousuke Doi, Toshimasa Nakayama | 2005-09-06 |
| 6884566 | Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | Tsuyoshi Nakamura, Taeko Ikegawa, Atsushi Sawano, Kousuke Doi | 2005-04-26 |
| 6620978 | Positive photoresist composition and process for synthesizing polyphenol compound | Satoshi Shimatani, Ken Miyagi, Satoshi Niikura, Toshimasa Nakayama | 2003-09-16 |
| 6566031 | Positive photoresist composition, substrate with a photosensitive film and process for imaging a resist pattern | Takako Suzuki, Kousuke Doi, Toshimasa Nakayama | 2003-05-20 |
| 6517993 | Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | Tsuyoshi Nakamura, Taeko Ikegawa, Atsushi Sawano, Kousuke Doi | 2003-02-11 |
| 6492085 | Positive photoresist composition and process and synthesizing polyphenol compound | Satoshi Shimatani, Ken Miyagi, Satoshi Niikura, Toshimasa Nakayama | 2002-12-10 |
| 6475694 | Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl group | Kousuke Doi, Ken Miyagi, Atsuko Hirata, Toshimasa Nakayama | 2002-11-05 |
| 6417317 | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin | Ken Miyagi, Kousuke Doi, Ryuusaku Takahashi, Toshimasa Nakayama | 2002-07-09 |
| 6406827 | Positive photoresist composition and process for forming resist pattern | Takako Suzuki, Kousuke Doi, Toshimasa Nakayama | 2002-06-18 |
| 6379859 | Positive photoresist composition and process for forming resist pattern using same | Takako Suzuki, Sachiko Tamura, Kousuke Doi, Toshimasa Nakayama | 2002-04-30 |
| 6312863 | Positive photoresist composition | Shinichi Hidesaka, Atsushi Sawano, Kousuke Doi, Toshimasa Nakayama | 2001-11-06 |
| 6300033 | Positive photoresist composition and process for forming resist pattern | Takako Suzuki, Kousuke Doi, Toshimasa Nakayama | 2001-10-09 |
| 6296992 | Positive photoresist composition and process for forming contact hole | Masaki Kurihara, Satoshi Niikura, Miki Kobayashi, Kousuke Doi, Toshimasa Nakayama | 2001-10-02 |
| 6207788 | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin | Ken Miyagi, Kousuke Doi, Ryuusaku Takahashi, Toshimasa Nakayama | 2001-03-27 |
| 6207340 | Positive photoresist composition and process for forming contact hole | Masaki Kurihara, Satoshi Niikura, Miki Kobayashi, Kousuke Doi, Toshimasa Nakayama | 2001-03-27 |
| 6187500 | Positive photoresist compositions and multilayer resist materials using same | Ken Miyagi, Kousuke Doi, Atsuko Hirata, Toshimasa Nakayama | 2001-02-13 |
| 6177226 | Positive photoresist composition and process for forming contact hole | Masaki Kurihara, Satoshi Niikura, Miki Kobayashi, Kousuke Doi, Toshimasa Nakayama | 2001-01-23 |
| 6127087 | Positive photoresist compositions and multilayer resist materials using same | Miki Kobayashi, Kousuke Doi, Sachiko Tamura, Toshimasa Nakayama | 2000-10-03 |
| 6120969 | Polyphenol compound, quinonediazide ester and positive photoresist composition | Mitsuo Hagihara, Kousuke Doi, Toshimasa Nakayama, Tetsuya Nakajima | 2000-09-19 |
| 6106994 | Production process of polyphenol diesters, and positive photosensitive compositions | Satoshi Niikura, Toshimasa Nakayama | 2000-08-22 |
| 6083657 | Positive photoresist compositions and a process for producing the same | Shinichi Kono, Yasuo Masuda, Atsushi Sawano, Hayato Ohno, Toshimasa Nakayama | 2000-07-04 |
| 6030741 | Positive resist composition | Kousuke Doi, Takako Suzuki, Toshimasa Nakayama | 2000-02-29 |
| 5853948 | Positive photoresist compositions and multilayer resist materials using the same | Atsushi Sawano, Junichi Mizuta, Kousuke Doi, Toshimasa Nakayama | 1998-12-29 |
| 5738968 | Positive photoresist composition | Hiroshi Hosoda, Taku Hirayama, Kousuke Doi, Satoshi Niikura, Toshimasa Nakayama | 1998-04-14 |
| 5728504 | Positive photoresist compositions and multilayer resist materials using the same | Hiroshi Hosoda, Satoshi Niikura, Atsushi Sawano, Tatsuya Hashiguchi, Kazuyuki Nitta +1 more | 1998-03-17 |