Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9740105 | Resist pattern formation method and resist composition | Yoichi Hori, Takeaki Shiroki | 2017-08-22 |
| 8367297 | Resist composition, method of forming resist pattern, novel compound and acid generator | Akiya Kawaue, Yoshiyuki Utsumi, Natsuko Maruyama | 2013-02-05 |
| 7927780 | Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator | Akiya Kawaue, Takeshi Iwai, Hideo Hada, Tsuyoshi Kurosawa, Natsuko Maruyama +4 more | 2011-04-19 |
| 7858286 | Positive resist composition and method for forming resist pattern | Yohei Kinoshita, Makiko Irie, Waki Ohkubo, Yusuke Nakagawa | 2010-12-28 |
| 7781144 | Positive resist composition and resist pattern forming method | Yohei Kinoshita, Waki Ohkubo, Yusuke Nakagawa, Makiko Irie | 2010-08-24 |
| 7582406 | Resist composition and method for forming resist pattern | Yusuke Nakagawa, Kazuhiko Nakayama | 2009-09-01 |
| 7329478 | Chemical amplified positive photo resist composition and method for forming resist pattern | Yusuke Nakagawa, Kenji Maruyama, Satoshi Shimatani, Masahiro Masujima, Kazuyuki Nitta | 2008-02-12 |
| 6551755 | Positive photoresist composition | Atsushi Sawano | 2003-04-22 |
| 6312863 | Positive photoresist composition | Atsushi Sawano, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama | 2001-11-06 |
| 5702862 | Positive photoresist coating solution comprising a mixed solvent of propylene glycol monopropyl ether and 2-heptanone | Hayato Ohno, Taku Nakao, Hisanobu Harada, Hidekatsu Kohara, Toshimasa Nakayama | 1997-12-30 |