Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10261415 | Chemically amplified positive-type photosensitive resin composition | Aya MOMOZAWA | 2019-04-16 |
| 9618842 | Resist composition and method of forming resist pattern | Yoshiyuki Utsumi | 2017-04-11 |
| 9448478 | Chemically amplified positive-type photosensitive resin composition for thick-film application | Aya MOMOZAWA, Yuta Yamamoto | 2016-09-20 |
| 9372403 | Chemically amplified photosensitive resin composition and method for producing resist pattern using the same | Shota Katayama | 2016-06-21 |
| 9323152 | Chemically amplified positive-type photosensitive resin composition and method for producing resist pattern using the same | — | 2016-04-26 |
| 8916332 | Resist composition, method of forming resist pattern, and polymeric compound | Tomoyuki Hirano, Daichi Takaki | 2014-12-23 |
| 8795947 | Resist composition and method of forming resist pattern | Tomoyuki Hirano, Kotaro Endo, Tsuyoshi Kurosawa | 2014-08-05 |
| 8574813 | Resist composition for immersion exposure and method of forming resist pattern | — | 2013-11-05 |
| 8394569 | Resist composition for immersion lithography and method for forming resist pattern | Takeshi Iwai | 2013-03-12 |
| 8278022 | Positive resist composition and method of forming resist pattern | Takeyoshi Mimura | 2012-10-02 |
| 8263307 | Positive resist composition and method of forming resist pattern | Takeshi Iwai | 2012-09-11 |
| 8192914 | Resist composition for immersion exposure and method of forming resist pattern | — | 2012-06-05 |
| 8187789 | Positive resist composition and method of forming resist pattern | Koji Yonemura, Hideo Hada | 2012-05-29 |
| 8029968 | Positive resist composition and method for resist pattern formation | Ryotaro Hayashi, Satoshi Yamada | 2011-10-04 |
| 8021824 | Polymer compound, resist composition and method of forming resist pattern | Jun Iwashita, Sho Abe, Takeshi Iwai | 2011-09-20 |
| 7858286 | Positive resist composition and method for forming resist pattern | Yohei Kinoshita, Waki Ohkubo, Yusuke Nakagawa, Shinichi Hidesaka | 2010-12-28 |
| 7858288 | Positive resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound | — | 2010-12-28 |
| 7799507 | Positive resist composition for immersion lithography and method for forming resist pattern | Kotaro Endo, Takeshi Iwai, Yoshiyuki Utsumi, Yasuhiro Yoshii, Tsuyoshi Nakamura | 2010-09-21 |
| 7781144 | Positive resist composition and resist pattern forming method | Yohei Kinoshita, Waki Ohkubo, Yusuke Nakagawa, Shinichi Hidesaka | 2010-08-24 |
| 7494762 | Positive resist composition for immersion lithography and method for forming resist pattern | Yasuhiro Yoshii | 2009-02-24 |