Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7858286 | Positive resist composition and method for forming resist pattern | Yohei Kinoshita, Makiko Irie, Yusuke Nakagawa, Shinichi Hidesaka | 2010-12-28 |
| 7781144 | Positive resist composition and resist pattern forming method | Yohei Kinoshita, Yusuke Nakagawa, Shinichi Hidesaka, Makiko Irie | 2010-08-24 |
| 7192687 | Positive resist composition and method of forming resist pattern using same | Kazuyuki Nitta, Satoshi Shimatani | 2007-03-20 |
| 6180313 | Poly (disulfonyl diazomethane) compound and positive-working chemical-amplification photoresist composition containing the same | Hiroto Yukawa, Kouki Tamura | 2001-01-30 |
| 6153733 | (Disulfonyl diazomethane compounds) | Hiroto Yukawa, Kouki Tamura, Toshiharu Shimamaki, Kei Mori | 2000-11-28 |