Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7147984 | Positive-working chemical-amplification photoresist composition | Katsumi Oomori, Ryusuke Uchida, Yukihiro Sawayanagi | 2006-12-12 |
| 6890697 | Positive-working chemical-amplification photoresist composition | Katsumi Oomori, Ryusuke Uchida, Kazufumi Sato | 2005-05-10 |
| 6869745 | Positive-working chemical-amplification photoresist composition | Katsumi Oomori, Ryusuke Uchida, Kazufumi Sato | 2005-03-22 |
| 6815144 | Positive-working chemical-amplification photoresist composition | Katsumi Oomori, Ryusuke Uchida, Kazufumi Sato | 2004-11-09 |
| 6773863 | Positive-working chemical-amplification photoresist composition | Katsumi Oomori, Ryusuke Uchida, Kazufumi Sato | 2004-08-10 |
| 6649322 | Positive resist composition and positive resist base material using the same | Satoshi Kumon | 2003-11-18 |
| 6548229 | Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same | Katsumi Oomori, Ryusuke Uchida, Kazufumi Sato | 2003-04-15 |
| 6485887 | Positive-working photoresist composition | Katsumi Oomori, Akiyoshi Yamazaki, Kazuo Tani, Yohei Kinoshita, Tomotaka Yamada | 2002-11-26 |
| 6387587 | Positive-working chemical-amplification photoresist composition | Katsumi Oomori, Ryusuke Uchida, Kazufumi Sato | 2002-05-14 |
| 6340553 | Positive-working photoresist composition | Katsumi Oomori, Akiyoshi Yamazaki, Kazuo Tani, Yohei Kinoshita, Tomotaka Yamada | 2002-01-22 |
| 6284430 | Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same | Katsumi Oomori, Ryusuke Uchida, Kazufumi Sato | 2001-09-04 |
| 6255041 | Method for formation of patterned resist layer | Katsumi Oomori, Ryusuke Uchida, Kazufumi Sato | 2001-07-03 |
| 6180313 | Poly (disulfonyl diazomethane) compound and positive-working chemical-amplification photoresist composition containing the same | Waki Ohkubo, Kouki Tamura | 2001-01-30 |
| 6153733 | (Disulfonyl diazomethane compounds) | Waki Ohkubo, Kouki Tamura, Toshiharu Shimamaki, Kei Mori | 2000-11-28 |