Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12120895 | Solar cell | Taisuke Matsui, Takeyuki Sekimoto, Takashi Nishihara, Teruaki Yamamoto | 2024-10-15 |
| 10363585 | Cleaning solution, method of removing a removal target and method of etching a substrate using said cleaning solution | Yuriko Shirai | 2019-07-30 |
| 7147984 | Positive-working chemical-amplification photoresist composition | Hiroto Yukawa, Katsumi Oomori, Yukihiro Sawayanagi | 2006-12-12 |
| 6890697 | Positive-working chemical-amplification photoresist composition | Katsumi Oomori, Hiroto Yukawa, Kazufumi Sato | 2005-05-10 |
| 6869745 | Positive-working chemical-amplification photoresist composition | Katsumi Oomori, Hiroto Yukawa, Kazufumi Sato | 2005-03-22 |
| 6815144 | Positive-working chemical-amplification photoresist composition | Katsumi Oomori, Hiroto Yukawa, Kazufumi Sato | 2004-11-09 |
| 6773863 | Positive-working chemical-amplification photoresist composition | Katsumi Oomori, Hiroto Yukawa, Kazufumi Sato | 2004-08-10 |
| 6548229 | Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same | Katsumi Oomori, Hiroto Yukawa, Kazufumi Sato | 2003-04-15 |
| 6387587 | Positive-working chemical-amplification photoresist composition | Katsumi Oomori, Hiroto Yukawa, Kazufumi Sato | 2002-05-14 |
| 6284430 | Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same | Katsumi Oomori, Hiroto Yukawa, Kazufumi Sato | 2001-09-04 |
| 6255041 | Method for formation of patterned resist layer | Katsumi Oomori, Hiroto Yukawa, Kazufumi Sato | 2001-07-03 |