Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11780946 | Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern | Daisuke Kawana, Yoshitaka Komuro, Masatoshi Arai, Nobuhiro MICHIBAYASHI, Takatoshi Inari | 2023-10-10 |
| 11560444 | Method of producing block copolymer capable of creating specific structure pattern | Teruaki Hayakawa, Seina Yamazaki, Daisuke Kawana, Yoshitaka Komuro, Takaya Maehashi +1 more | 2023-01-24 |
| 11261299 | Block copolymer and method of producing the same, and method of producing structure containing phase-separated structure | Daisuke Kawana, Takehiro Seshimo, Teruaki Hayakawa, Lei DONG, Rin Odashima | 2022-03-01 |
| 10941253 | Block copolymer, and method of producing structure containing phase-separated structure | Teruaki Hayakawa, Seina Yamazaki, Rin Odashima, Takehiro Seshimo, Daisuke Kawana | 2021-03-09 |
| 7741008 | Positive resist composition, positive resist composition for thermal flow, and resist pattern forming method | Sanae Furuya, Hideo Hada, Yusuke Nakagawa | 2010-06-22 |
| 7629105 | Positive photoresist composition and method of forming resist pattern | Kazuo Tani, Naoto Motoike, Satoshi Maemori, Sachiko Yoshizawa | 2009-12-08 |
| RE38254 | Positive resist composition | Kazufumi Sato, Kazuyuki Nitta, Yoshika Banba, Toshimasa Nakayama | 2003-09-16 |
| 6485887 | Positive-working photoresist composition | Katsumi Oomori, Hiroto Yukawa, Kazuo Tani, Yohei Kinoshita, Tomotaka Yamada | 2002-11-26 |
| 6340553 | Positive-working photoresist composition | Katsumi Oomori, Hiroto Yukawa, Kazuo Tani, Yohei Kinoshita, Tomotaka Yamada | 2002-01-22 |
| 6159652 | Positive resist composition | Mitsuru Sato, Kazuyuki Nitta, Etsuko Iguchi, Yoshika Sakai, Kazufumi Sato +1 more | 2000-12-12 |
| 5955240 | Positive resist composition | Kazufumi Sato, Kazuyuki Nitta, Yoshika Sakai, Toshimasa Nakayama | 1999-09-21 |
| 5948589 | Positive-working photoresist composition | Kazufumi Sato, Kazuyuki Nitta, Yoshika Sakai, Toshimasa Nakayama | 1999-09-07 |
| 5945248 | Chemical-sensitization positive-working photoresist composition | Kazuyuki Nitta, Kazufumi Sato, Yoshika Sakai, Toshimasa Nakayama | 1999-08-31 |
| 5908730 | Chemical-sensitization photoresist composition | Kazuyuki Nitta, Kazufumi Sato, Yoshika Sakai, Toshimasa Nakayama | 1999-06-01 |
| 5874195 | Positive-working photoresist composition | Kazufumi Sato, Kazuyuki Nitta, Yoshika Sakai, Toshimasa Nakayama | 1999-02-23 |
| 5856058 | Chemical-sensitization positive-working photoresist composition | Kazufumi Sato, Kazuyuki Nitta, Yoshika Sakai, Toshimasa Nakayama | 1999-01-05 |
| 5854357 | Process for the production of polyhydroxstyrene | Mitsuru Sato, Kazuyuki Nitta, Etsuko Iguchi, Yoshika Sakai, Kazufumi Sato +1 more | 1998-12-29 |
| 5817444 | Positive-working photoresist composition and multilayered resist material using the same | Kazufumi Sato, Kazuyuki Nitta, Yoshika Sakai, Toshimasa Nakayama | 1998-10-06 |
| 5770343 | Positive-working photoresist composition | Kazufumi Sato, Kazuyuki Nitta, Yoshika Sakai, Toshimasa Nakayama | 1998-06-23 |
| 5736296 | Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound | Mitsuru Sato, Kazuyuki Nitta, Etsuko Iguchi, Yoshika Sakai, Kazufumi Sato +1 more | 1998-04-07 |