Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6159652 | Positive resist composition | Mitsuru Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Etsuko Iguchi, Kazufumi Sato +1 more | 2000-12-12 |
| 5955240 | Positive resist composition | Kazufumi Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Toshimasa Nakayama | 1999-09-21 |
| 5948589 | Positive-working photoresist composition | Kazufumi Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Toshimasa Nakayama | 1999-09-07 |
| 5945248 | Chemical-sensitization positive-working photoresist composition | Kazuyuki Nitta, Kazufumi Sato, Akiyoshi Yamazaki, Toshimasa Nakayama | 1999-08-31 |
| 5908730 | Chemical-sensitization photoresist composition | Kazuyuki Nitta, Kazufumi Sato, Akiyoshi Yamazaki, Toshimasa Nakayama | 1999-06-01 |
| 5874195 | Positive-working photoresist composition | Kazufumi Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Toshimasa Nakayama | 1999-02-23 |
| 5856058 | Chemical-sensitization positive-working photoresist composition | Kazufumi Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Toshimasa Nakayama | 1999-01-05 |
| 5854357 | Process for the production of polyhydroxstyrene | Mitsuru Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Etsuko Iguchi, Kazufumi Sato +1 more | 1998-12-29 |
| 5817444 | Positive-working photoresist composition and multilayered resist material using the same | Kazufumi Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Toshimasa Nakayama | 1998-10-06 |
| 5770343 | Positive-working photoresist composition | Kazufumi Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Toshimasa Nakayama | 1998-06-23 |
| 5736296 | Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound | Mitsuru Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Etsuko Iguchi, Kazufumi Sato +1 more | 1998-04-07 |