Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6734258 | Protective coating composition for dual damascene process | Jun Koshiyama, Kazumasa Wakiya | 2004-05-11 |
| 6693049 | Method for filling fine hole | Takeshi Tanaka | 2004-02-17 |
| 6689535 | Anti-reflective coating composition, multilayer photoresist material using the same, and method for forming pattern | Takeshi Tanaka, Kazumasa Wakiya | 2004-02-10 |
| 6599682 | Method for forming a finely patterned photoresist layer | Kazumasa Wakiya | 2003-07-29 |
| 6544717 | Undercoating composition for photolithographic resist | Takako Hirosaki, Masakazu Kobayashi | 2003-04-08 |
| 6319815 | Electric wiring forming method with use of embedding material | Masakazu Kobayashi, Yasumitsu Taira | 2001-11-20 |
| 6297174 | Method for the formation of a planarizing coating film on substrate surface | Takako Hirosaki, Masakazu Kobayashi | 2001-10-02 |
| 6284428 | Undercoating composition for photolithographic resist | Takako Hirosaki, Masakazu Kobayashi | 2001-09-04 |
| 6268108 | Composition for forming antireflective coating film and method for forming resist pattern using same | Masakazu Kobayashi, Hiroshi Komano, Toshimasa Nakayama | 2001-07-31 |
| 6159652 | Positive resist composition | Mitsuru Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai, Kazufumi Sato +1 more | 2000-12-12 |
| 6087068 | Undercoating composition for photolithographic resist | Mitsuru Sato, Katsumi Oomori, Kiyoshi Ishikawa, Fumitake Kaneko | 2000-07-11 |
| 6083665 | Photoresist laminate and method for patterning using the same | Mitsuru Sato, Katsumi Oomori, Kiyoshi Ishikawa, Fumitake Kaneko, Toshimasa Nakayama | 2000-07-04 |
| 6071673 | Method for the formation of resist pattern | Toshimasa Nakayama, Taiichiro Aoki | 2000-06-06 |
| 6042988 | Chemical-amplification-type negative resist composition | Mitsuro Sato, Katsumi Oomori, Kiyoshi Ishikawa, Fumitake Kaneko, Yoshiki Sugeta | 2000-03-28 |
| 5948847 | Undercoating composition for photolithographic patterning | Mitsuru Sato | 1999-09-07 |
| 5939510 | Undercoating composition for photolithographic resist | Mitsuru Sato, Katsumi Oomori, Kiyoshi Ishikawa, Fumitake Kaneko | 1999-08-17 |
| 5925495 | Photoresist laminate and method for patterning using the same | Mitsuru Sato, Katsumi Oomori, Kiyoshi Ishikawa, Fumitake Kaneko, Toshimasa Nakayama | 1999-07-20 |
| 5908738 | Undercoating composition for photolithography | Mitsuru Sato, Katsumi Oomori, Kiyoshi Ishikawa, Toshimasa Nakayama | 1999-06-01 |
| 5854357 | Process for the production of polyhydroxstyrene | Mitsuru Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai, Kazufumi Sato +1 more | 1998-12-29 |
| 5789136 | Negative-working photoresist composition | Mitsuru Sato, Katsumi Oomori, Kiyoshi Ishikawa, Fumitake Kaneko | 1998-08-04 |
| 5756255 | Undercoating composition for photolithography | Mitsuru Sato, Katsumi Oomori, Kiyoshi Ishikawa, Toshimasa Nakayama | 1998-05-26 |
| 5736296 | Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound | Mitsuru Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai, Kazufumi Sato +1 more | 1998-04-07 |
| 5700625 | Negative-working photoresist composition | Mitsuru Sato, Katsumi Oomori, Kiyoshi Ishikawa, Fumitake Kaneko | 1997-12-23 |