Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9040220 | Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern | Hideo Hada, Yoshiyuki Utsumi, Keita Ishiduka, Kensuke Matsuzawa, Kyoko Ohshita +2 more | 2015-05-26 |
| 9034556 | Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern | Hideo Hada, Yoshiyuki Utsumi, Keita Ishiduka, Kensuke Matsuzawa, Kyoko Ohshita +2 more | 2015-05-19 |
| 8206891 | Positive resist composition and method of forming resist pattern | Takehiro Seshimo, Yoshiyuki Utsumi, Akiya Kawaue, Takahiro Dazai, Tomoyuki Hirano +1 more | 2012-06-26 |
| 8187798 | Method of forming fine patterns | Yoshiki Sugeta, Toshikazu Tachikawa | 2012-05-29 |
| 8142980 | Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent | Yoshiki Sugeta, Toshikazu Tachikawa, Naohisa Ueno | 2012-03-27 |
| 8124318 | Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent | Yoshiki Sugeta, Toshikazu Tachikawa | 2012-02-28 |
| 7811748 | Resist pattern forming method and composite rinse agent | Jun Koshiyama, Kazumasa Wakiya, Atsushi Miyamoto, Hidekazu Tajima, Yoshihiro Sawada | 2010-10-12 |
| 7741260 | Rinsing fluid for lithography | Jun Koshiyama, Kazumasa Wakiya, Atsushi Miyamoto, Hidekazu Tajima, Yoshihiro Sawada | 2010-06-22 |
| 7553610 | Method of forming fine patterns | Yoshiki Sugeta, Toshikazu Tachikawa | 2009-06-30 |
| 7235345 | Agent for forming coating for narrowing patterns and method for forming fine pattern using the same | Yoshiki Sugeta, Toshikazu Tachikawa | 2007-06-26 |
| 7189499 | Method of forming fine patterns | Yoshiki Sugeta, Toshikazu Tachikawa | 2007-03-13 |
| 7033731 | Multilayered body for photolithographic patterning | Toshikazu Tachikawa, Naotaka Kubota, Miwa Miyairi, Takako Hirosaki, Koutaro Endo | 2006-04-25 |
| 6864036 | Negative-working photoresist composition | Toshikazu Tachikawa, Naotaka Kubota, Miwa Miyairi, Takako Hirosaki, Koutaro Endo | 2005-03-08 |
| 6811817 | Method for reducing pattern dimension in photoresist layer | Yoshiki Sugeta, Toshikazu Tachikawa | 2004-11-02 |
| 6544712 | Negative working resist composition | Toshikazu Tachikawa, Miwa Miyairi, Masakazu Kobayashi | 2003-04-08 |
| 6455228 | Multilayered body for photolithographic patterning | Toshikazu Tachikawa, Naotaka Kubota, Miwa Miyairi, Takako Hirosaki, Koutaro Endo | 2002-09-24 |
| 6406829 | Negative-working photoresist composition | Toshikazu Tachikawa, Naotaka Kubota, Miwa Miyairi, Takako Hirosaki, Koutaro Endo | 2002-06-18 |
| 6245930 | Chemical-sensitization resist composition | Katsumi Oomori, Hideo Hada, Mitsuru Sato, Kazufumi Sato, Toshimasa Nakayama | 2001-06-12 |
| 6171749 | Negative-working chemical-amplification photoresist composition | Toshikazu Tachikawa, Satoshi Fujimura, Miwa Miyairi, Hiroshi Komano, Toshimasa Nakayama | 2001-01-09 |
| 6087068 | Undercoating composition for photolithographic resist | Mitsuru Sato, Katsumi Oomori, Etsuko Iguchi, Kiyoshi Ishikawa | 2000-07-11 |
| 6083665 | Photoresist laminate and method for patterning using the same | Mitsuru Sato, Katsumi Oomori, Etsuko Iguchi, Kiyoshi Ishikawa, Toshimasa Nakayama | 2000-07-04 |
| 6042988 | Chemical-amplification-type negative resist composition | Mitsuro Sato, Katsumi Oomori, Etsuko Iguchi, Kiyoshi Ishikawa, Yoshiki Sugeta | 2000-03-28 |
| 5976760 | Chemical-sensitization resist composition | Katsumi Oomori, Hideo Hada, Mitsuru Sato, Kazufumi Sato, Toshimasa Nakayama | 1999-11-02 |
| 5939510 | Undercoating composition for photolithographic resist | Mitsuru Sato, Katsumi Oomori, Etsuko Iguchi, Kiyoshi Ishikawa | 1999-08-17 |
| 5925495 | Photoresist laminate and method for patterning using the same | Mitsuru Sato, Katsumi Oomori, Etsuko Iguchi, Kiyoshi Ishikawa, Toshimasa Nakayama | 1999-07-20 |