Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8367312 | Detergent for lithography and method of forming resist pattern with the same | Yoshihiro Sawada, Kazumasa Wakiya, Jun Koshiyama, Atsushi Miyamoto, Tomoya Kumagai +1 more | 2013-02-05 |
| 7897325 | Lithographic rinse solution and method for forming patterned resist layer using the same | Yoshihiro Sawada, Jun Koshiyama, Kazumasa Wakiya, Atsushi Miyamoto | 2011-03-01 |
| 7811748 | Resist pattern forming method and composite rinse agent | Jun Koshiyama, Kazumasa Wakiya, Fumitake Kaneko, Atsushi Miyamoto, Yoshihiro Sawada | 2010-10-12 |
| 7795197 | Cleaning liquid for lithography and method for resist pattern formation | Yoshihiro Sawada, Kazumasa Wakiya, Jun Koshiyama, Atsushi Miyamoto | 2010-09-14 |
| 7741260 | Rinsing fluid for lithography | Jun Koshiyama, Kazumasa Wakiya, Fumitake Kaneko, Atsushi Miyamoto, Yoshihiro Sawada | 2010-06-22 |