Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11773287 | Method for forming coating | Shunichi MASHITA | 2023-10-03 |
| 11120993 | Diffusing agent composition and method of manufacturing semiconductor substrate | Keisuke Kubo, Shunichi MASHITA | 2021-09-14 |
| 10525418 | Purification method for purifying liquid, purification method for purifying silicon compound-containing liquid, method for producing silylating agent liquid, film forming material or diffusing agent composition, filter medium and filter device | Tsukasa Sugawara | 2020-01-07 |
| 10504732 | Impurity diffusion agent composition and method for manufacturing semiconductor substrate | Yu TAKAHASHI | 2019-12-10 |
| 10242875 | Impurity diffusion agent composition and method for manufacturing semiconductor substrate | Yu TAKAHASHI, Takuya Ohhashi | 2019-03-26 |
| 10242874 | Diffusing agent composition and method of manufacturing semiconductor substrate | — | 2019-03-26 |
| 9905917 | Antenna device | Yohei Koga, Hiroyuki Egawa, Naozumi Anzai, Kazutoshi Taniyama, Michihiro Konishi | 2018-02-27 |
| 9831086 | Method for manufacturing semiconductor substrate | Yu TAKAHASHI | 2017-11-28 |
| 9713262 | Via adding method | Kenji Nagase, Yoshiaki Hiratsuka, Tomoyuki Nakao, Keisuke Nakamura | 2017-07-18 |
| 9620354 | Method for manufacturing semiconductor substrate with diffusion agent composition | — | 2017-04-11 |
| 9507905 | Storage medium storing circuit board design assistance program, circuit board design assistance method, and circuit board design assistance device | Yoshiaki Hiratsuka, Kenji Nagase, Tomoyuki Nakao, Keisuke Nakamura | 2016-11-29 |
| 9173295 | Support apparatus | Kenji Nagase, Yoshiaki Hiratsuka, Tomoyuki Nakao, Keisuke Nakamura | 2015-10-27 |
| 8850376 | Method, device, and a computer-readable recording medium having stored program for information processing for noise suppression design check | Tomoyuki Nakao, Yoshiaki Hiratsuka, Keisuke Nakamura, Kenji Nagase | 2014-09-30 |
| 8790990 | Silica-based film forming material for formation of air gaps, and method for forming air gaps | — | 2014-07-29 |
| 8584076 | Printed circuit board design assisting device, method, and program | Kenji Nagase, Yoshiaki Hiratsuka, Tomoyuki Nakao, Keisuke Nakamura | 2013-11-12 |
| 8367312 | Detergent for lithography and method of forming resist pattern with the same | Kazumasa Wakiya, Jun Koshiyama, Hidekazu Tajima, Atsushi Miyamoto, Tomoya Kumagai +1 more | 2013-02-05 |
| 8058220 | Cleaning liquid for lithography and a cleaning method using it for photoexposure devices | Jun Koshiyama, Jiro Yokoya, Tomoyuki Hirano | 2011-11-15 |
| 7952578 | Support apparatus, design support program, and design support method | — | 2011-05-31 |
| 7897325 | Lithographic rinse solution and method for forming patterned resist layer using the same | Jun Koshiyama, Kazumasa Wakiya, Atsushi Miyamoto, Hidekazu Tajima | 2011-03-01 |
| 7811748 | Resist pattern forming method and composite rinse agent | Jun Koshiyama, Kazumasa Wakiya, Fumitake Kaneko, Atsushi Miyamoto, Hidekazu Tajima | 2010-10-12 |
| 7795197 | Cleaning liquid for lithography and method for resist pattern formation | Kazumasa Wakiya, Jun Koshiyama, Atsushi Miyamoto, Hidekazu Tajima | 2010-09-14 |
| 7741260 | Rinsing fluid for lithography | Jun Koshiyama, Kazumasa Wakiya, Fumitake Kaneko, Atsushi Miyamoto, Hidekazu Tajima | 2010-06-22 |
| 6528172 | COATING SOLUTIONS FOR USE IN FORMING BISMUTH-BASED FERROELECTRIC THIN FILMS, AND FERROELECTRIC THIN FILMS, FERROELECTRIC CAPACITORS AND FERROELECTRIC MEMORIES FORMED WITH SAID COATING SOLUTIONS, AS WELL AS PROCESSES FOR PRODUCTION THEREOF | Akira Hashimoto, Ichiro Koiwa, Juro Mita, Yukihisa Okada, Takao Kanehara +1 more | 2003-03-04 |
| 6403160 | Ferroelectric thin film, production method thereof and coating liquid for making thin film | Ichiro Koiwa, Juro Mita, Takao Kanehara, Akira Hashimoto | 2002-06-11 |
| 6303231 | Coating solutions for use in forming bismuth-based ferroelectric thin films, and ferroelectric memories formed with said coating solutions, as well as processes for production thereof | Akira Hashimoto, Tetsuya Osaka, Ichiro Koiwa, Juro Mita, Yoshinori Maeno +2 more | 2001-10-16 |