Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9494866 | Resist composition and method of forming resist pattern | Tsuyoshi Nakamura, Hiroaki Shimizu, Hideto Nito | 2016-11-15 |
| 9459528 | Negative tone resist composition for solvent developing and method of forming resist pattern | Tomohiro Oikawa, Rikita Tsunoda, Yusuke Suzuki | 2016-10-04 |
| 9411224 | Method of forming resist pattern | Tsuyoshi Nakamura, Hiroaki Shimizu, Masaru Takeshita, Hideto Nito, Hirokuni Saito | 2016-08-09 |
| 9405200 | Resist composition and method of forming resist pattern | Tsuyoshi Nakamura, Hiroaki Shimizu, Hideto Nito | 2016-08-02 |
| 9377685 | Resist composition and method of forming resist pattern | Hiroaki Shimizu, Tsuyoshi Nakamura, Hideto Nito | 2016-06-28 |
| 9029070 | Resist composition and method of forming resist pattern | Hiroaki Shimizu, Tsuyoshi Nakamura, Hideto Nito | 2015-05-12 |
| 9023577 | Resist composition and method of forming resist pattern | Masaru Takeshita, Hirokuni Saito, Tsuyoshi Nakamura | 2015-05-05 |
| 9023585 | Resist composition and method of forming resist pattern | Tsuyoshi Nakamura, Hideto Nito, Hiroaki Shimizu | 2015-05-05 |
| 8968990 | Method of forming resist pattern | Tsuyoshi Nakamura, Hiroaki Shimizu, Hideto Nito | 2015-03-03 |
| 8956800 | Resist composition and method of forming resist pattern | Hiroaki Shimizu, Tsuyoshi Nakamura, Hideto Nito | 2015-02-17 |
| 8900795 | Resist composition, method of forming resist pattern and novel compound | Yoshiyuki Utsumi, Hiroaki Shimizu | 2014-12-02 |
| 8877432 | Method of forming resist pattern and resist composition | Tsuyoshi Nakamura, Masaru Takeshita, Yasuhiro Yoshii, Hirokuni Saito | 2014-11-04 |
| 8486605 | Positive resist composition and method of forming resist pattern | Masaru Takeshita, Yasuhiro Yoshii, Hirokuni Saito, Tsuyoshi Nakamura | 2013-07-16 |
| 8409360 | Cleaning method for a process of liquid immersion lithography | Jun Koshiyama, Tomoyuki Hirano, Hiromitsu Tsuji | 2013-04-02 |
| 8058220 | Cleaning liquid for lithography and a cleaning method using it for photoexposure devices | Jun Koshiyama, Yoshihiro Sawada, Tomoyuki Hirano | 2011-11-15 |