Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8758471 | Mat, method for producing the mat, and exhaust gas purifying apparatus | — | 2014-06-24 |
| 8409360 | Cleaning method for a process of liquid immersion lithography | Jun Koshiyama, Jiro Yokoya, Tomoyuki Hirano | 2013-04-02 |
| 7924400 | Method for measuring liquid immersion lithography soluble fraction in organic film | Nobuyuki Kohda, Masaaki Yoshida, Takayuki Yajima | 2011-04-12 |
| 7700257 | Photoresist composition and resist pattern formation method by the use thereof | Toshiyuki Ogata, Kotaro Endo, Masaaki Yoshida | 2010-04-20 |
| 7592122 | Photoresist composition, and low-molecular compound and high-molecular compound for the photoresist composition | Toshiyuki Ogata, Kotaro Endo, Masaaki Yoshida, Mitsuru Sato, Syogo Matsumaru +1 more | 2009-09-22 |
| 7326512 | Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound | Toshiyuki Ogata, Kotaro Endo, Masaaki Yoshida, Hideo Hada, Ryoichi Takasu +1 more | 2008-02-05 |
| 7264918 | Resist composition for liquid immersion exposure process and method of forming resist pattern therewith | Kotaro Endo, Masaaki Yoshida, Taku Hirayama, Toshiyuki Ogata, Mitsuru Sato | 2007-09-04 |