Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10576432 | Polyimide and/or polyamideimide porous body and method for manufacturing same, method for separation and/or adsorption, separation material, adsorption material, filter media, laminate, and filter device | Tsukasa Sugawara, Masanori Ichikawa, Mitsuharu Tobari | 2020-03-03 |
| 10576433 | Method for purifying liquid, method for producing chemical solution or cleaning solution, filter medium, and filter device | Hayato Takashima, Takao Nakajima, Tsukasa Sugawara | 2020-03-03 |
| 9291905 | Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography | Tomoya Kumagai, Naohisa Ueno | 2016-03-22 |
| 9244358 | Surface treatment liquid, surface treatment method, hydrophobilization method, and hydrophobilized substrate | Kazumasa Wakiya | 2016-01-26 |
| 8623131 | Surface treatment agent and surface treatment method | Masaaki Yoshida, Mai Sugawara | 2014-01-07 |
| 8455182 | Composition for antireflection film formation and method for resist pattern formation using the composition | Atsushi Sawano, Takako Hirosaki | 2013-06-04 |
| 8409360 | Cleaning method for a process of liquid immersion lithography | Jiro Yokoya, Tomoyuki Hirano, Hiromitsu Tsuji | 2013-04-02 |
| 8410296 | Surface treatment agent and surface treatment method | Masaaki Yoshida, Mai Sugawara, Naohisa Ueno | 2013-04-02 |
| 8367312 | Detergent for lithography and method of forming resist pattern with the same | Yoshihiro Sawada, Kazumasa Wakiya, Hidekazu Tajima, Atsushi Miyamoto, Tomoya Kumagai +1 more | 2013-02-05 |
| 8216775 | Anti-reflection film forming material, and method for forming resist pattern using the same | Yuriko Shirai, Takako Hirosaki, Masahiro Masujima, Atsushi Sawano | 2012-07-10 |
| 8158328 | Composition for formation of anti-reflection film, and method for formation of resist pattern using the same | Atsushi Sawano, Takako Hirosaki | 2012-04-17 |
| 8124312 | Method for forming pattern, and material for forming coating film | Kiyoshi Ishikawa, Kazumasa Wakiya | 2012-02-28 |
| 8058220 | Cleaning liquid for lithography and a cleaning method using it for photoexposure devices | Yoshihiro Sawada, Jiro Yokoya, Tomoyuki Hirano | 2011-11-15 |
| 7897325 | Lithographic rinse solution and method for forming patterned resist layer using the same | Yoshihiro Sawada, Kazumasa Wakiya, Atsushi Miyamoto, Hidekazu Tajima | 2011-03-01 |
| 7884062 | Cleaning liquid for lithography and cleaning method using same | Hideya Kobari | 2011-02-08 |
| 7811748 | Resist pattern forming method and composite rinse agent | Kazumasa Wakiya, Fumitake Kaneko, Atsushi Miyamoto, Hidekazu Tajima, Yoshihiro Sawada | 2010-10-12 |
| 7795197 | Cleaning liquid for lithography and method for resist pattern formation | Yoshihiro Sawada, Kazumasa Wakiya, Atsushi Miyamoto, Hidekazu Tajima | 2010-09-14 |
| 7741260 | Rinsing fluid for lithography | Kazumasa Wakiya, Fumitake Kaneko, Atsushi Miyamoto, Hidekazu Tajima, Yoshihiro Sawada | 2010-06-22 |
| 7576046 | Cleaning liquid for lithography and method of cleaning therewith | Yasumitsu Taira, Chima Shinohara | 2009-08-18 |
| 7179399 | Material for forming protective film | Kazumasa Wakiya | 2007-02-20 |
| 6835530 | Base material for lithography | Etsuko Nakamura, Takeshi Tanaka | 2004-12-28 |
| 6734258 | Protective coating composition for dual damascene process | Etsuko Iguchi, Kazumasa Wakiya | 2004-05-11 |
| 6117623 | Remover solvent for partial removal of photoresist layer | Futoshi Shimai, Hidehito Fukushima | 2000-09-12 |
| 6015467 | Method of removing coating from edge of substrate | Koichi Nagasawa, Naomi Kawaguchi, Futoshi Shimai, Mitsuru Sato, Kouji Harada | 2000-01-18 |
| 5518860 | Positive-working quinonediazide photoresist composition containing hydroxyalkyl substituted pyridine compound | Satoshi Niikura, Tetsuya Kato, Kouichi Takahashi, Hidekatsu Kohara, Toshimasa Nakayama | 1996-05-21 |