Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8455182 | Composition for antireflection film formation and method for resist pattern formation using the composition | Jun Koshiyama, Takako Hirosaki | 2013-06-04 |
| 8367312 | Detergent for lithography and method of forming resist pattern with the same | Yoshihiro Sawada, Kazumasa Wakiya, Jun Koshiyama, Hidekazu Tajima, Atsushi Miyamoto +1 more | 2013-02-05 |
| 8323745 | Application liquid and method for formation of a silica-based coating film using the application liquid | Tokonori Yamadaya, Kiyoshi Ishikawa | 2012-12-04 |
| 8216775 | Anti-reflection film forming material, and method for forming resist pattern using the same | Yuriko Shirai, Takako Hirosaki, Masahiro Masujima, Jun Koshiyama | 2012-07-10 |
| 8158328 | Composition for formation of anti-reflection film, and method for formation of resist pattern using the same | Jun Koshiyama, Takako Hirosaki | 2012-04-17 |
| 6884566 | Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | Tsuyoshi Nakamura, Taeko Ikegawa, Kousuke Doi, Hidekatsu Kohara | 2005-04-26 |
| 6551755 | Positive photoresist composition | Shinichi Hidesaka | 2003-04-22 |
| 6517993 | Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | Tsuyoshi Nakamura, Taeko Ikegawa, Kousuke Doi, Hidekatsu Kohara | 2003-02-11 |
| 6312863 | Positive photoresist composition | Shinichi Hidesaka, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama | 2001-11-06 |
| 6083657 | Positive photoresist compositions and a process for producing the same | Shinichi Kono, Yasuo Masuda, Hayato Ohno, Hidekatsu Kohara, Toshimasa Nakayama | 2000-07-04 |
| 5853948 | Positive photoresist compositions and multilayer resist materials using the same | Junichi Mizuta, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama | 1998-12-29 |
| 5728504 | Positive photoresist compositions and multilayer resist materials using the same | Hiroshi Hosoda, Satoshi Niikura, Tatsuya Hashiguchi, Kazuyuki Nitta, Hidekatsu Kohara +1 more | 1998-03-17 |
| 5576138 | Positive-working naphtho quinone diazide sulfonic acid ester photoresist composition containing select combination of additives | Yoshito Ando, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1996-11-19 |