Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6083657 | Positive photoresist compositions and a process for producing the same | Shinichi Kono, Yasuo Masuda, Atsushi Sawano, Hidekatsu Kohara, Toshimasa Nakayama | 2000-07-04 |
| 5702862 | Positive photoresist coating solution comprising a mixed solvent of propylene glycol monopropyl ether and 2-heptanone | Taku Nakao, Hisanobu Harada, Shinichi Hidesaka, Hidekatsu Kohara, Toshimasa Nakayama | 1997-12-30 |
| 5604077 | Positive-working photoresist composition comprising a novolac resin made in butyrolactone as a solvent | Shinichi Kono, Hidekatsu Kohara, Toshimasa Nakayama | 1997-02-18 |
| 5332647 | "Positive-working quinone diazide composition containing N,N',N""-substituted isocyanurate compound and associated article" | Nobuo Tokutake, Satoshi Niikura, Hidekatsu Kohara, Toshimasa Nakayama | 1994-07-26 |