Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7402372 | Positive resist composition and method of forming resist pattern | Mitsuo Hagihara, Kazuyuki Nitta | 2008-07-22 |
| 7364831 | Positive resist composition and resist pattern formation method | Kouji Yonemura | 2008-04-29 |
| 7094924 | Method for decreasing surface defects of patterned resist layer | Kazuyuki Nitta, Satoshi Maemori, Tatsuya Matsumi | 2006-08-22 |
| 6677103 | Positive-working photoresist composition | Kazufumi Sato, Satoshi Maemori, Kazuyuki Nitta | 2004-01-13 |
| 6605417 | Method for decreasing surface defects of patterned resist layer | Kazuyuki Nitta, Satoshi Maemori, Tatsuya Matsumi | 2003-08-12 |
| 6444394 | Positive-working photoresist composition | Kazufumi Sato, Satoshi Maemori, Kazuyuki Nitta | 2002-09-03 |
| 5702862 | Positive photoresist coating solution comprising a mixed solvent of propylene glycol monopropyl ether and 2-heptanone | Hayato Ohno, Hisanobu Harada, Shinichi Hidesaka, Hidekatsu Kohara, Toshimasa Nakayama | 1997-12-30 |
| 5601961 | High-sensitivity positive-working photoresist composition | Kazuhiko Nakayama, Kousuke Doi, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1997-02-11 |
| 5599653 | Pattern forming method with selective silylation utilizing lithographic double-coated patterning plate with undercoat levelling layer | Hiroyuki Yamazaki, Nobuo Tokutake, Masato Saito, Hidekatsu Kohara, Toshimasa Nakayama | 1997-02-04 |
| 5498514 | Lithographic double-coated patterning plate with undercoat levelling layer | Hiroyuki Yamazaki, Nobuo Tokutake, Masato Saito, Hidekatsu Kohara, Toshimasa Nakayama | 1996-03-12 |
| 5478692 | Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenone | Kousuke Doi, Remi Numata, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1995-12-26 |
| 5434031 | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | Remi Numata, Kousuke Doi, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1995-07-18 |