Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5501936 | Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound | Hiroshi Hosoda, Kousuke Doi, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1996-03-26 |
| 5478692 | Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenone | Kousuke Doi, Taku Nakao, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1995-12-26 |
| 5434031 | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | Taku Nakao, Kousuke Doi, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1995-07-18 |