Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7935397 | Ink jet recording medium and ink jet recording method | Teruaki Okuda, Yoshiyuki Nagase, Asako Watanabe | 2011-05-03 |
| 7425457 | Method and apparatus for irradiating simulated solar radiation | Akio Hasebe | 2008-09-16 |
| 6132817 | Method of manufacturing photoelectric transducer with improved ultrasonic and purification steps | Masafumi Sano, Ryo Hayashi, Makoto Higashikawa | 2000-10-17 |
| 5601961 | High-sensitivity positive-working photoresist composition | Kazuhiko Nakayama, Taku Nakao, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama | 1997-02-11 |
| 5599653 | Pattern forming method with selective silylation utilizing lithographic double-coated patterning plate with undercoat levelling layer | Taku Nakao, Hiroyuki Yamazaki, Masato Saito, Hidekatsu Kohara, Toshimasa Nakayama | 1997-02-04 |
| 5576138 | Positive-working naphtho quinone diazide sulfonic acid ester photoresist composition containing select combination of additives | Yoshito Ando, Atsushi Sawano, Hidekatsu Kohara, Toshimasa Nakayama | 1996-11-19 |
| 5501936 | Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound | Hiroshi Hosoda, Remi Numata, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama | 1996-03-26 |
| 5498514 | Lithographic double-coated patterning plate with undercoat levelling layer | Taku Nakao, Hiroyuki Yamazaki, Masato Saito, Hidekatsu Kohara, Toshimasa Nakayama | 1996-03-12 |
| 5478692 | Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenone | Kousuke Doi, Taku Nakao, Remi Numata, Hidekatsu Kohara, Toshimasa Nakayama | 1995-12-26 |
| 5434031 | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | Taku Nakao, Remi Numata, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama | 1995-07-18 |
| 5401605 | Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound | Kousuke Doi, Hiroshi Hosoda, Kouichi Takahashi, Hidekatsu Kohara, Toshimasa Nakayama | 1995-03-28 |
| 5384228 | Alkali-developable positive-working photosensitive resin composition | Kousuke Doi, Satoshi Niikura, Hidekatsu Kohara, Toshimasa Nakayama | 1995-01-24 |
| 5332647 | "Positive-working quinone diazide composition containing N,N',N""-substituted isocyanurate compound and associated article" | Hayato Ohno, Satoshi Niikura, Hidekatsu Kohara, Toshimasa Nakayama | 1994-07-26 |
| 4985333 | Positive-working photosensitive composition with three difference 1,2-naphthoquinone diazide sulfonic acid esters to include the ester of curcumin | Koichi Takahashi, Yoshiyuki Satoh, Hidekatsu Kohara, Toshimasa Nakayama | 1991-01-15 |
| 4882260 | Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye | Hidekatsu Kohara, Masanori Miyabe, Toshimasa Nakayama, Shingo Asaumi, Hatsuyuki Tanaka +1 more | 1989-11-21 |