Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5281508 | Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol | Hidekatsu Kohara, Hatsuyuki Tanaka, Yoshiaki Arai, Shingo Asaumi, Toshimasa Nakayama +2 more | 1994-01-25 |
| 5180653 | Electron beam-curable resist composition and method for fine patterning using the same | Hidekatsu Kohara, Toshimasa Nakayama | 1993-01-19 |
| 5057397 | Electron beam-curable resist composition and method for fine patterning using the same | Hidekatsu Kohara, Toshimasa Nakayama | 1991-10-15 |
| 4906549 | Positive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atoms | Shingo Asaumi, Hidekatsu Kohara, Hatsuyuki Tanaka, Toshimasa Nakayama | 1990-03-06 |
| 4882260 | Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye | Hidekatsu Kohara, Nobuo Tokutake, Toshimasa Nakayama, Shingo Asaumi, Hatsuyuki Tanaka +1 more | 1989-11-21 |
| 4731319 | Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins | Hidekatsu Kohara, Hatsuyuki Tanaka, Yoshiaki Arai, Shingo Asaumi, Toshimasa Nakayama | 1988-03-15 |