Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5281508 | Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol | Hidekatsu Kohara, Hatsuyuki Tanaka, Masanori Miyabe, Yoshiaki Arai, Toshimasa Nakayama +2 more | 1994-01-25 |
| 4906549 | Positive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atoms | Hidekatsu Kohara, Hatsuyuki Tanaka, Masanori Miyabe, Toshimasa Nakayama | 1990-03-06 |
| 4882260 | Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye | Hidekatsu Kohara, Nobuo Tokutake, Masanori Miyabe, Toshimasa Nakayama, Hatsuyuki Tanaka +1 more | 1989-11-21 |
| 4844832 | Containing an arylsulfonic acid, a phenol and a naphalenic solvent | Masakazu Kobayashi, Akira Yokota, Hisashi Nakane | 1989-07-04 |
| 4833067 | Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant | Hatsuyuki Tanaka, Hidekatsu Kohara, Yoshiyuki Sato, Toshimasa Nakayama, Akira Yokota +1 more | 1989-05-23 |
| 4824762 | Method for rinse treatment of a substrate | Masakazu Kobayashi, Hatsuyuki Tanaka | 1989-04-25 |
| 4804612 | Highly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturation | Hidekatsu Kohara, Hatsuyuki Tanaka, Toshimasa Nakayama | 1989-02-14 |
| 4784937 | Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant | Hatsuyuki Tanaka, Hidekatsu Kohara, Yoshiyuki Sato, Toshimasa Nakayama, Akira Yokota +1 more | 1988-11-15 |
| 4738915 | Positive-working O-quinone diazide photoresist composition with 2,3,4-trihydroxybenzophenone | Takashi Komine, Akira Yokota, Hisashi Nakane | 1988-04-19 |
| 4731319 | Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins | Hidekatsu Kohara, Hatsuyuki Tanaka, Masanori Miyabe, Yoshiaki Arai, Toshimasa Nakayama | 1988-03-15 |
| 4385086 | Method for preventing leaching of contaminants from solid surfaces | Muneo Nakayama, Hisashi Nakane, Akira Yokota | 1983-05-24 |