Issued Patents All Time
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5261566 | Solution-dropping nozzle device | — | 1993-11-16 |
| 5238713 | Spin-on method and apparatus for applying coating material to a substrate, including an air flow developing and guiding step/means | Hiroyoshi Sago, Hideyuki Mizuki, Katsuhiko Kudo | 1993-08-24 |
| 5156884 | Method for forming a film of oxidized metal | Katsuya Tanitsu, Akira Hashimoto, Toshihiro Nishimura | 1992-10-20 |
| 5116250 | Method and apparatus for applying a coating material to a substrate | Hiroyoshi Sago, Hideyuki Mizuki, Katsuhiko Kudo | 1992-05-26 |
| 4960618 | Process for formation of metal oxide film | Katsuya Tanitsu, Yoshimi Sato | 1990-10-02 |
| 4941426 | Thin-film coating apparatus | Hiroyoshi Sago, Hideyuki Mizuki, Katsuhiko Kudo | 1990-07-17 |
| 4908065 | Coating solution for use in the formation of metal oxide film | Katsuya Tanitsu, Yoshimi Sato | 1990-03-13 |
| 4900582 | Method for improving film quality of silica-based films | Akira Hashimoto, Toshihiro Nishimura, Eiichi Kashiwagi, Isamu Hijikata | 1990-02-13 |
| 4894254 | Method of forming silicone film | Akira Hashimoto, Toshihiro Nishimura, Akira Uehara, Isamu Hijikata | 1990-01-16 |
| 4867345 | Thin-film coating apparatus | — | 1989-09-19 |
| 4868096 | Surface treatment of silicone-based coating films | Akira Uehara, Akira Hashimoto, Toshihiro Nishimura, Isamu Hijikata, Mitsuaki Minato +1 more | 1989-09-19 |
| 4865649 | Coating solution for forming a silica-based coating film | Eiichi Kashiwagi, Akira Hashimoto, Toshihiro Nishimura | 1989-09-12 |
| 4835017 | Liquid composition for forming silica-based coating film | Tsutomu Ishikawa, Akira Hashimoto, Toshihiro Nishimura | 1989-05-30 |
| 4793862 | Silica-based antimony containing film-forming composition | Tsutomu Ishikawa, Akira Hashimoto, Toshihiro Nishimura | 1988-12-27 |
| 4790262 | Thin-film coating apparatus | Akira Uehara, Hiroyoshi Sago, Hideyuki Mizuki | 1988-12-13 |
| 4749436 | Equipment for thermal stabilization process of photoresist pattern on semiconductor wafer | Mitsuaki Minato, Isamu Hijikata, Akira Uehara | 1988-06-07 |
| 4694040 | Liquid composition for forming a coating film of organopolysiloxane and method for the preparation thereof | Akira Hashimoto, Toshihiro Nishimura, Hisashi Nakane, Shozo Toda | 1987-09-15 |
| D291413 | Wafer holding frame | Akira Uehara, Isamu Hijikata, Hisashi Nakane | 1987-08-18 |
| 4597882 | Process for regenerating waste oils of synthetic lubricants containing fluorine atom | Toshihiro Nishimura, Akira Hashimoto | 1986-07-01 |
| 4550242 | Automatic plasma processing device and heat treatment device for batch treatment of workpieces | Akira Uehara, Isamu Hijikata, Hisashi Nakane | 1985-10-29 |
| 4550239 | Automatic plasma processing device and heat treatment device | Akira Uehara, Isamu Hijikata, Hisashi Nakane | 1985-10-29 |
| 4542710 | Solution-dropping nozzle device | — | 1985-09-24 |
| 4528934 | Thin-film coating apparatus | — | 1985-07-16 |
| 4527865 | Electrochromic display device | Junichi Washo, Takaaki Miyazaki, Mitsuo Ishii, Akira Hashimoto, Toshihiro Nishimura | 1985-07-09 |
| 4474642 | Method for pattern-wise etching of a metallic coating film | Hisashi Nakane, Akira Hashimoto, Toshihiro Nishimura | 1984-10-02 |