Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5281508 | Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol | Hidekatsu Kohara, Hatsuyuki Tanaka, Masanori Miyabe, Yoshiaki Arai, Shingo Asaumi +2 more | 1994-01-25 |
| 4904571 | Remover solution for photoresist | Tsuyoshi Miyashita, Shigeru Ohtawa, Hiroyuki Tohda, Shozo Toda | 1990-02-27 |
| 4902770 | Undercoating material for photosensitive resins | Wataru Ishii, Shozo Miyazawa, Shinji Tsuchiya, Akira Yokota | 1990-02-20 |
| 4844832 | Containing an arylsulfonic acid, a phenol and a naphalenic solvent | Masakazu Kobayashi, Shingo Asaumi, Akira Yokota | 1989-07-04 |
| 4833067 | Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant | Hatsuyuki Tanaka, Hidekatsu Kohara, Yoshiyuki Sato, Shingo Asaumi, Toshimasa Nakayama +1 more | 1989-05-23 |
| 4797348 | Method of forming a positive resist pattern in photoresist of o-naphthoquinone diazide and bisazide with UV imaging exposure and far UV overall exposure | Yoichi Nakamura, Shirushi Yamamoto, Takashi Komine, Akira Yokota | 1989-01-10 |
| 4784937 | Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant | Hatsuyuki Tanaka, Hidekatsu Kohara, Yoshiyuki Sato, Shingo Asaumi, Toshimasa Nakayama +1 more | 1988-11-15 |
| 4738915 | Positive-working O-quinone diazide photoresist composition with 2,3,4-trihydroxybenzophenone | Takashi Komine, Shingo Asaumi, Akira Yokota | 1988-04-19 |
| 4737438 | Negative-working photosensitive composition comprising a diphenylamine-melamine condensate and an azide compound | Naoki Ito, Koichiro Hashimoto, Wataru Ishii | 1988-04-12 |
| 4735890 | Photomasks for photolithographic fine patterning | — | 1988-04-05 |
| 4702992 | Method of preparing photoresist material with undercoating of photoextinction agent and condensation product | Wataru Ishii, Shozo Miyazawa, Shinji Tsuchiya, Akira Yokota | 1987-10-27 |
| 4694040 | Liquid composition for forming a coating film of organopolysiloxane and method for the preparation thereof | Akira Hashimoto, Toshihiro Nishimura, Muneo Nakayama, Shozo Toda | 1987-09-15 |
| D291413 | Wafer holding frame | Akira Uehara, Isamu Hijikata, Muneo Nakayama | 1987-08-18 |
| 4610953 | Aqueous developer solution for positive type photoresists with tetramethyl ammonium hydroxide and trimethyl hydroxyethyl ammonium hydroxide | Koichiro Hashimoto, Shirushi Yamamoto, Akira Yokota | 1986-09-09 |
| 4590149 | Method for fine pattern formation on a photoresist | Akira Yokota, Mitsuo Yabuta, Minoru Tsuda, Wataru Ishii | 1986-05-20 |
| 4588675 | Method for fine pattern formation on a photoresist | Akira Yokota, Mitsuo Yabuta, Wataru Ishii | 1986-05-13 |
| 4578559 | Plasma etching method | Isamu Hijikata, Akira Uehara | 1986-03-25 |
| 4557996 | Method for providing a pattern-wise photoresist layer on a substrate plate and a surface-protected substrate plate therefor | Toshimi Aoyama, Hiroyuki Tohda, Kazuo Kato | 1985-12-10 |
| 4550242 | Automatic plasma processing device and heat treatment device for batch treatment of workpieces | Akira Uehara, Isamu Hijikata, Muneo Nakayama | 1985-10-29 |
| 4550239 | Automatic plasma processing device and heat treatment device | Akira Uehara, Isamu Hijikata, Muneo Nakayama | 1985-10-29 |
| 4483651 | Automatic apparatus for continuous treatment of leaf materials with gas plasma | Akira Uehara, Shigekazu Miyazaki, Hiroyuki Kiyota, Isamu Hijikata | 1984-11-20 |
| 4474642 | Method for pattern-wise etching of a metallic coating film | Muneo Nakayama, Akira Hashimoto, Toshihiro Nishimura | 1984-10-02 |
| 4465553 | Method for dry etching of a substrate surface | Isamu Hijikata, Akira Uehara | 1984-08-14 |
| 4401745 | Composition and process for ultra-fine pattern formation | Wataru Kanai, Minoru Tsuda | 1983-08-30 |
| 4385086 | Method for preventing leaching of contaminants from solid surfaces | Muneo Nakayama, Akira Yokota, Shingo Asaumi | 1983-05-24 |