Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5716753 | Positive-working quinone diazide resist composition containing organic phosphoric compound and an amine and process for the formation of fine pattern using same | Hiroshi Yoshimoto, Nobuo Suzuki, Shinya Katoh, Hiroaki Matsuura | 1998-02-10 |
| 5380618 | Micropattern-forming material having a low molecular weight novolak resin, a quinone diazide sulfonyl ester and a solvent | Tadayoshi Kokubo, Kazuya Uenishi, Shiro Tan | 1995-01-10 |
| 4902770 | Undercoating material for photosensitive resins | Shozo Miyazawa, Shinji Tsuchiya, Hisashi Nakane, Akira Yokota | 1990-02-20 |
| 4737438 | Negative-working photosensitive composition comprising a diphenylamine-melamine condensate and an azide compound | Naoki Ito, Koichiro Hashimoto, Hisashi Nakane | 1988-04-12 |
| 4702992 | Method of preparing photoresist material with undercoating of photoextinction agent and condensation product | Shozo Miyazawa, Shinji Tsuchiya, Hisashi Nakane, Akira Yokota | 1987-10-27 |
| 4590149 | Method for fine pattern formation on a photoresist | Hisashi Nakane, Akira Yokota, Mitsuo Yabuta, Minoru Tsuda | 1986-05-20 |
| 4588675 | Method for fine pattern formation on a photoresist | Hisashi Nakane, Akira Yokota, Mitsuo Yabuta | 1986-05-13 |