Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5707777 | Light-sensitive composition | Toshiaki Aoai | 1998-01-13 |
| 5576143 | Light-sensitive composition | Toshiaki Aoai | 1996-11-19 |
| 5576139 | Positive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalyst | Kazuya Uenishi, Shiro Tan, Yasumasa Kawabe | 1996-11-19 |
| 5565300 | Positive photoresist composition | Kazuya Uenishi, Shinji Sakaguchi | 1996-10-15 |
| 5494773 | Positive photoresist composition comprising a novolak resin having a cycloalkylidene-bisphenol group | Shiro Tan, Yasumasa Kawabe | 1996-02-27 |
| 5429905 | Positive working photoresist composition containing naphthoquinone diazide sulfonic acid ester of polyhydroxy compound | Shiro Tan, Yasumasa Kawabe | 1995-07-04 |
| 5389492 | Resist composition comprising a siloxane or silsesquioxane polymer having silanol groups in a composition with a naphthoquinone compound | Atsushi Sakamoto, Akinobu Tanaka, Hiroshi Ban | 1995-02-14 |
| 5380618 | Micropattern-forming material having a low molecular weight novolak resin, a quinone diazide sulfonyl ester and a solvent | Kazuya Uenishi, Shiro Tan, Wataru Ishii | 1995-01-10 |
| 5360692 | Positive type 1,2-naphthoquinonediazide photoresist composition containing benzotriazole light absorbing agent | Yasumasa Kawabe, Kazuya Uenishi | 1994-11-01 |
| 5340686 | Positive-type photoresist composition | Shinji Sakaguchi, Shiro Tan | 1994-08-23 |
| 5340688 | Positive type photoresist composition | Yasumasa Kawabe, Toshiaki Aoai | 1994-08-23 |
| 5340697 | Negative type photoresist composition | Hiroshi Yoshimoto, Kazuya Uenishi | 1994-08-23 |
| 5324618 | Positive type quinonediazide photoresist composition containing select tetraphenolic additive | Yasumasa Kawabe, Shiro Tan | 1994-06-28 |
| 5324619 | Positive quinone diazide photoresist composition containing select polyhydroxy additive | Yasumasa Kawabe, Kazuya Uenishi | 1994-06-28 |
| 5318875 | Positive quinonediazide photoresist composition containing select hydroxyphenol additive | Yasumasa Kawabe, Toshiaki Aoai, Shiro Tan | 1994-06-07 |
| 5290658 | Positive type photoresist composition comprising polyaromatic hydroxy quinone diazide esters as the photosensitive ingredient | Kazuya Uenishi, Yasumasa Kawabe | 1994-03-01 |
| 5248582 | Positive-type photoresist composition | Kazuya Uenishi, Shinji Sakaguchi | 1993-09-28 |
| 5173389 | Positive-working photoresist composition | Kazuya Uenishi, Shinji Sakaguchi | 1992-12-22 |
| 5153096 | Positive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazide | Kazuya Uenishi, Yasumasa Kawabe | 1992-10-06 |
| 5130224 | Positive-working photoresist composition | Yasumasa Kawabe | 1992-07-14 |
| 5110709 | Light-sensitive positive working composition containing a pisolfone compound | Toshiaki Aoai | 1992-05-05 |
| 5089373 | Positive photoresist composition utilizing O-quinonediazide and novolak resin | Kazuya Uenishi, Yasumasa Kawabe | 1992-02-18 |
| 5030550 | Developer for positive type photoresists | Yasumasa Kawabe, Hiroshi Matsumoto | 1991-07-09 |
| 4894311 | Positive-working photoresist composition | Kazuya Uenishi, Yasumasa Kawabe | 1990-01-16 |
| 4871645 | Positive-working photoresist composition | Kazuya Uenishi, Yasumasa Kawabe | 1989-10-03 |