SS

Shinji Sakaguchi

Fujitsu Limited: 33 patents #645 of 24,456Top 3%
Ricoh Company: 7 patents #2,977 of 9,818Top 35%
ND National Patent Development: 1 patents #10 of 36Top 30%
NI Ngk Insulators: 1 patents #1,271 of 2,083Top 65%
Overall (All Time): #75,699 of 4,157,543Top 2%
41
Patents All Time

Issued Patents All Time

Showing 1–25 of 41 patents

Patent #TitleCo-InventorsDate
12099896 Image reading apparatus, image reading method, and non-transitory recording medium Hirofumi Ono, Ayumu HASHIMOTO 2024-09-24
11973904 Signal processing device, imaging device, reading device, image forming device, and signal processing method Tohru Kanno, Masamoto Nakazawa 2024-04-30
11792539 Solid-state imaging element, reading device, image processing apparatus, and control method Masamoto Nakazawa 2023-10-17
11009905 Semiconductor integrated circuit and clock supply method including a sample and hold circuit Isamu Miyanishi, Yuuya Miyoshi, Tohru Kanno 2021-05-18
10250830 Solid-state imaging device, image reading device, and image forming apparatus Tohru Kanno 2019-04-02
10217788 Imaging device Tohru Kanno 2019-02-26
8135872 USB controller and a testing method of the USB controller 2012-03-13
6649106 Method for debindering of powder molded body Shigeki Kato, Takayuki Kawae 2003-11-18
6497996 Fine pattern forming method Masayuki Naya 2002-12-24
5750310 Positive photoresist composition Kenichiro Sato, Makoto Momota 1998-05-12
5747218 Positive photoresist composition Makoto Momota, Kenichiro Sato 1998-05-05
5700620 Radiation ray sensitive resin compostion containing at least two different naphthoquinonediazide sulfonic acid esters and an alkali-soluble low-molecular compound Toshiaki Aoai, Kenichiro Sato 1997-12-23
5683851 Positive photoresist composition Shiro Tan 1997-11-04
5652081 Positive working photoresist composition Shiro Tan, Yasumasa Kawabe 1997-07-29
5639587 Positive photoresist composition containing alkali soluble resins and quinonediazide ester mixture Kenichiro Sato, Koji Shirakawa 1997-06-17
5629128 Positive photoresist composition Koji Shirakawa, Kenichiro Sato, Kunihiko Kodama, Yasumasa Kawabe 1997-05-13
5609983 Positive working photosensitive compositions Koichi Kawamura, Kenichiro Sato 1997-03-11
5609982 Positive-working photoresist composition Kenichiro Sato, Yasumasa Kawabe, Toshiaki Aoai 1997-03-11
5565300 Positive photoresist composition Kazuya Uenishi, Tadayoshi Kokubo 1996-10-15
5340686 Positive-type photoresist composition Shiro Tan, Tadayoshi Kokubo 1994-08-23
5248582 Positive-type photoresist composition Kazuya Uenishi, Tadayoshi Kokubo 1993-09-28
5173389 Positive-working photoresist composition Kazuya Uenishi, Tadayoshi Kokubo 1992-12-22
4883739 Light-sensitive resin composition with 1,2-naphthoquinone diazide compound having spirobichroman or spirobiinoane ring Shiro Tan 1989-11-28
4659607 Retouchable mat film Shinzi Kataoka, Yukio Shinagawa 1987-04-21
4626495 Photographic image receiving elements for silver salt diffusion transfer processes 1986-12-02