Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9090722 | Chemical amplification resist composition, and mold preparation method and resist film using the same | Toru Fujimori, Toshihiro Usa, Kenji Sugiyama, Takayuki Ito, Hideaki Tsubaki +3 more | 2015-07-28 |
| 9034560 | Negative resist composition and pattern forming method using the same | Tadateru Yatsuo | 2015-05-19 |
| 8900791 | Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition | Tomotaka Tsuchimura, Toru Tsuchihashi, Hideaki Tsubaki | 2014-12-02 |
| 8637222 | Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern | Toru Tsuchihashi, Tadateru Yatsuo, Hideaki Tsubaki, Akira Asano | 2014-01-28 |
| 8546063 | Organic solvent development or multiple development pattern-forming method using electron beams or EUV rays | Hideaki Tsubaki, Toru Tsuchihashi | 2013-10-01 |
| 8080362 | Positive resist composition | Toru Fujimori, Shoichiro Yasunami | 2011-12-20 |
| 7432034 | Negative resist composition | Shoichiro Yasunami | 2008-10-07 |
| 7361446 | Positive resist composition | Toru Fujimori, Shoichiro Yasunami | 2008-04-22 |
| 7332258 | Positive resist composition and process for forming pattern using the same | Shoichiro Yasunami | 2008-02-19 |
| 7326513 | Positive working resist composition | Shoichiro Yasunami, Kazuyoshi Mizutani | 2008-02-05 |
| 6887647 | Negative-working resist composition for electron beams or x-rays | Shoichiro Yasunami, Yutaka Adegawa | 2005-05-03 |
| 6773862 | Negative resist composition | Yutaka Adegawa, Shoichiro Yasunami | 2004-08-10 |
| 6746813 | Negative resist composition | Shoichiro Yasunami, Yutaka Adegawa | 2004-06-08 |
| 6727040 | Positive resist composition to be irradiated with one of an electron beam and X-ray | Tomoya Sasaki, Kazuyoshi Mizutani | 2004-04-27 |
| 6673512 | Negative-working resist composition | Kazuya Uenishi, Yutaka Adegawa | 2004-01-06 |
| 6489080 | Positive resist composition | Kazuya Uenishi, Toru Fujimori, Kunihiko Kodama, Shiro Tan | 2002-12-03 |
| 5714303 | Image forming method using strippable layer and light-sensitive polymerizable layer containing silver halide | Hiroaki Yokoya | 1998-02-03 |
| 5639587 | Positive photoresist composition containing alkali soluble resins and quinonediazide ester mixture | Kenichiro Sato, Shinji Sakaguchi | 1997-06-17 |
| 5629128 | Positive photoresist composition | Kenichiro Sato, Kunihiko Kodama, Yasumasa Kawabe, Shinji Sakaguchi | 1997-05-13 |
| 5612167 | Image forming method using strippable layer and light-sensitive polymerizable layer containing silver halide | Hiroaki Yokoya | 1997-03-18 |