Issued Patents All Time
Showing 1–25 of 71 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10126653 | Pattern forming method and resist composition | Kaoru Iwato, Shohei Kataoka, Shinji Tarutani, Sou Kamimura, Keita Kato +3 more | 2018-11-13 |
| 9929376 | Laminate, kit for manufacturing organic semiconductor, and resist composition for manufacturing organic semiconductor | Yu Iwai, Ichiro KOYAMA, Yoshitaka Kamochi | 2018-03-27 |
| 9709892 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | Shohei Kataoka, Kaoru Iwato, Sou Kamimura, Toru Tsuchihashi, Yuichiro Enomoto +3 more | 2017-07-18 |
| 9551935 | Pattern forming method and resist composition | Keita Kato, Shinji Tarutani, Toru Tsuchihashi, Sou Kamimura, Yuichiro Enomoto +3 more | 2017-01-24 |
| 8785104 | Resist composition and pattern forming method using the same | Jiro Yokoyama, Shinichi Sugiyama | 2014-07-22 |
| 8603733 | Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method | Shinji Tarutani, Hideaki Tsubaki, Kenji Wada, Wataru HOSHINO | 2013-12-10 |
| 8349535 | Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith | Kana Fujii, Takamitsu Tomiga, Toru Tsuchihashi, Jiro Yokoyama, Shinichi Sugiyama +2 more | 2013-01-08 |
| 8142977 | Positive resist composition and pattern forming method using the same | Shinichi Sugiyama | 2012-03-27 |
| 8092977 | Positive resist composition and pattern forming method using the same | — | 2012-01-10 |
| 8084187 | Resist composition and pattern forming method using the same | Toru Tsuchihashi | 2011-12-27 |
| 8034547 | Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method | Hideaki Tsubaki, Shinji Tarutani, Kenji Wada, Wataru HOSHINO | 2011-10-11 |
| 8017304 | Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method | Shinji Tarutani, Hideaki Tsubaki, Kenji Wada, Wataru HOSHINO | 2011-09-13 |
| 7989137 | Resist composition and pattern-forming method using the same | Shuji Hirano, Shinichi Sugiyama, Jiro Yokoyama | 2011-08-02 |
| 7923196 | Positive resist composition and pattern forming method using the same | Toru Tsuchihashi, Shuji Hirano, Jiro Yokoyama, Shinichi Sugiyama | 2011-04-12 |
| 7887988 | Positive resist composition and pattern forming method using the same | Kaoru Iwato, Kunihiko Kodama, Masaomi Makino | 2011-02-15 |
| 7807329 | Photosensitive composition and pattern-forming method using the same | Yasutomo Kawanishi | 2010-10-05 |
| 7645557 | Positive resist composition for immersion exposure and pattern forming method using the same | Hiromi Kanda, Haruki Inabe | 2010-01-12 |
| 7625690 | Positive resist composition and pattern forming method using the same | Kaoru Iwato, Kunihiko Kodama, Masaomi Makino, Toru Tsuchihashi | 2009-12-01 |
| 7592118 | Positive resist composition and pattern forming method using the same | Shuji Hirano, Shinichi Sugiyama | 2009-09-22 |
| 7521168 | Resist composition for electron beam, EUV or X-ray | Hyou Takahashi | 2009-04-21 |
| 7374860 | Positive resist composition and pattern forming method using the same | Shuji Hirano | 2008-05-20 |
| 7344821 | Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same | — | 2008-03-18 |
| 7335454 | Positive resist composition | Shinichi Kanna, Kunihiko Kodama, Tomoya Sasaki | 2008-02-26 |
| 7326513 | Positive working resist composition | Shoichiro Yasunami, Koji Shirakawa | 2008-02-05 |
| 7250246 | Positive resist composition and pattern formation method using the same | — | 2007-07-31 |