Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12422750 | Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device | Kazuomi Inoue, Kazuto Shimada | 2025-09-23 |
| 10344177 | Under layer film-forming composition for imprints and method for forming pattern | Hirotaka KITAGAWA | 2019-07-09 |
| 10248019 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | Shohei Kataoka, Kaoru Iwato, Kana Fujii, Sou Kamimura, Keita Kato +1 more | 2019-04-02 |
| 10175576 | Curable composition for photo imprints, method for forming pattern, fine pattern, and method for manufacturing semiconductor device | Hirotaka KITAGAWA, Yuichiro Goto | 2019-01-08 |
| 10126653 | Pattern forming method and resist composition | Kaoru Iwato, Shohei Kataoka, Shinji Tarutani, Sou Kamimura, Keita Kato +3 more | 2018-11-13 |
| 9897922 | Method of forming pattern and developer for use in the method | Shinji Tarutani, Sou Kamimura, Kaoru Iwato, Keita Kato, Kana Fujii | 2018-02-20 |
| 9868846 | Curable composition for imprints, patterning method and pattern | Kunihiko Kodama, Kazuyuki Usuki, Tadashi Omatsu, Hirotaka KITAGAWA | 2018-01-16 |
| 9862847 | Inkjet discharge method, pattern formation method, and pattern | Yuichiro Goto, Tadashi OOMATSU, Hirotaka KITAGAWA, Kenichi Kodama | 2018-01-09 |
| 9796803 | Under layer film-forming composition for imprints and method of forming pattern | Hirotaka KITAGAWA, Akiko HATTORI | 2017-10-24 |
| 9709892 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | Shohei Kataoka, Kaoru Iwato, Sou Kamimura, Toru Tsuchihashi, Kana Fujii +3 more | 2017-07-18 |
| 9663671 | Curable composition for imprints and method of storing the same | Kunihiko Kodama, Shinji Tarutani | 2017-05-30 |
| 9551935 | Pattern forming method and resist composition | Keita Kato, Shinji Tarutani, Toru Tsuchihashi, Sou Kamimura, Kana Fujii +3 more | 2017-01-24 |
| 9507263 | Underlay film composition for imprints and method of forming pattern and pattern formation method using the same | Kunihiko Kodama, Shinji Tarutani, Tadashi OOMATSU, Takayuki Ito, Hirotaka KITAGAWA +1 more | 2016-11-29 |
| 9482958 | Method of forming pattern and developer for use in the method | Shinji Tarutani, Sou Kamimura, Kaoru Iwato, Keita Kato, Kana Fujii | 2016-11-01 |
| 9263289 | Adhesion-promoting composition used between curable composition for imprints and substrate, and semiconductor device using the same | Akiko HATTORI, Hirotaka KITAGAWA | 2016-02-16 |
| 9223219 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | Shinji Tarutani, Sou Kamimura, Kaoru Iwato, Keita Kato, Akinori Shibuya | 2015-12-29 |
| 9116437 | Pattern forming method, chemical amplification resist composition and resist film | Sou Kamimura, Shinji Tarutani | 2015-08-25 |
| 9097973 | Method of forming pattern and developer for use in the method | Shinji Tarutani, Sou Kamimura, Kaoru Iwato, Keita Kato, Kana Fujii | 2015-08-04 |
| 8999621 | Pattern forming method, chemical amplification resist composition and resist film | Sou Kamimura, Shinji Tarutani, Keita Kato, Kaoru Iwato | 2015-04-07 |
| 8933144 | Curable composition for imprint, pattern-forming method and pattern | Kunihiko Kodama, Shinji Tarutani | 2015-01-13 |
| 8911930 | Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and pattern | Shinji Tarutani, Akinori Shibuya, Shuhei Yamaguchi | 2014-12-16 |
| 8877828 | Method for producing curable composition for imprints | Kunihiko Kodama, Shinji Tarutani | 2014-11-04 |
| 8871642 | Method of forming pattern and developer for use in the method | Shinji Tarutani, Sou Kamimura, Keita Kato, Kana Fujii | 2014-10-28 |
| 8820541 | Method for producing curable composition for imprints | Kunihiko Kodama, Shinji Tarutani | 2014-09-02 |
| 8808965 | Pattern forming method, pattern, chemical amplification resist composition and resist film | Kaoru Iwato, Shinji Tarutani, Sou Kamimura, Keita Kato | 2014-08-19 |