Issued Patents All Time
Showing 1–25 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11201352 | Electrolytic solution for non-aqueous secondary battery, non-aqueous secondary battery, and metal complex | — | 2021-12-14 |
| 10923769 | Electrolytic solution for non-aqueous secondary battery and non-aqueous secondary battery | Naoya HATAKEYAMA | 2021-02-16 |
| 10717706 | M-phenylenediamine compound and method for producing polymer compound using same | Koji HIRONAKA, Masato SENOO, Tetsu Kitamura, Sotaro INOMATA, Satoshi Sano +1 more | 2020-07-21 |
| 10649329 | Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device | Akinori Shibuya, Keiyu OU | 2020-05-12 |
| 10248019 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | Kaoru Iwato, Kana Fujii, Sou Kamimura, Yuichiro Enomoto, Keita Kato +1 more | 2019-04-02 |
| 10126653 | Pattern forming method and resist composition | Kaoru Iwato, Shinji Tarutani, Sou Kamimura, Keita Kato, Yuichiro Enomoto +3 more | 2018-11-13 |
| 9709892 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | Kaoru Iwato, Sou Kamimura, Toru Tsuchihashi, Yuichiro Enomoto, Kana Fujii +3 more | 2017-07-18 |
| 9551935 | Pattern forming method and resist composition | Keita Kato, Shinji Tarutani, Toru Tsuchihashi, Sou Kamimura, Yuichiro Enomoto +3 more | 2017-01-24 |
| 9523912 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound | Akinori Shibuya, Toshiaki Fukuhara, Hajime Furutani, Michihiro SHIRAKAWA | 2016-12-20 |
| 9482947 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device | Shuhei Yamaguchi, Hidenori Takahashi, Michihiro SHIRAKAWA, Shoichi SAITOH, Fumihiro YOSHINO | 2016-11-01 |
| 9454079 | Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern | Akinori Shibuya, Yoko TOKUGAWA, Tomoki Matsuda, Junichi Ito, Toshiaki Fukuhara +4 more | 2016-09-27 |
| 9405197 | Pattern forming method, method for manufacturing electronic device, and electronic device | Akinori Shibuya, Tomoki Matsuda, Toshiaki Fukuhara, Akiyoshi GOTO | 2016-08-02 |
| 9316910 | Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film | Hidenori Takahashi, Shuhei Yamaguchi, Shoichi SAITOH, Michihiro SHIRAKAWA, Fumihiro YOSHINO | 2016-04-19 |
| 9250519 | Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition for use in the method | Akinori Shibuya, Akiyoshi GOTO, Tomoki Matsuda, Toshiaki Fukuhara | 2016-02-02 |
| 9223204 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same | Takayuki Ito, Hidenori Takahashi, Tomotaka Tsuchimura, Takeshi Inasaki | 2015-12-29 |
| 9152049 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | Akinori Shibuya, Shuhei Yamaguchi, Hisamitsu Tomeba | 2015-10-06 |
| 9120288 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for preparing electronic device, and electronic device | Hidenori Takahashi, Shuhei Yamaguchi, Michihiro SHIRAKAWA, Fumihiro YOSHINO, Shoichi SAITOH | 2015-09-01 |
| 8999622 | Pattern forming method, chemical amplification resist composition and resist film | Kaoru Iwato | 2015-04-07 |
| 8895222 | Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition | Tomotaka Tsuchimura, Hidenori Takahashi, Takayuki Ito, Takeshi Inasaki | 2014-11-25 |
| 8846290 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | Naohiro TANGO, Michihiro SHIRAKAWA, Mitsuhiro Fujita, Shuhei Yamaguchi, Akinori Shibuya | 2014-09-30 |
| 8846293 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition | Yusuke Iizuka, Akinori Shibuya, Naohiro TANGO | 2014-09-30 |
| 8841060 | Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device | Yusuke Iizuka, Akinori Shibuya, Tomoki Matsuda, Naohiro TANGO | 2014-09-23 |
| 8663907 | Method of forming pattern | Keita Kato, Sou Kamimura, Yuichiro Enomoto, Kaoru Iwato, Shoichi SAITOH | 2014-03-04 |
| 8557499 | Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition | Shuhei Yamaguchi, Akinori Shibuya | 2013-10-15 |
| 8329379 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same | Takayuki Ito, Hidenori Takahashi, Tomotaka Tsuchimura, Takeshi Inasaki | 2012-12-11 |