Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12306538 | Treatment liquid and pattern forming method | Hideaki Tsubaki, Wataru Nihashi, Kei Yamamoto | 2025-05-20 |
| 11042094 | Treatment liquid and pattern forming method | Shuji Hirano, Hideaki Tsubaki, Wataru Nihashi, Kei Yamamoto | 2021-06-22 |
| 10962884 | Treatment liquid and pattern forming method | Hideaki Tsubaki, Wataru Nihashi, Kei Yamamoto | 2021-03-30 |
| 10890847 | Pattern forming method, resist pattern, method for manufacturing electronic device, and electronic device | Wataru Nihashi, Hideaki Tsubaki | 2021-01-12 |
| 10788754 | Pattern forming method and electronic device manufacturing method | Wataru Nihashi, Hideaki Tsubaki | 2020-09-29 |
| 10761426 | Pattern forming method, method for manufacturing electronic device, and laminate | Hideaki Tsubaki, Wataru Nihashi, Kei Yamamoto | 2020-09-01 |
| 10663864 | Pattern forming method, method for manufacturing electronic device, and laminate | Wataru Nihashi, Hideaki Tsubaki, Kei Yamamoto | 2020-05-26 |
| 10599038 | Rinsing liquid, pattern forming method, and electronic device manufacturing method | Hideaki Tsubaki, Wataru Nihashi | 2020-03-24 |
| 10562991 | Developer, pattern forming method, and electronic device manufacturing method | Hideaki Tsubaki, Wataru Nihashi | 2020-02-18 |
| 10394127 | Pattern forming method and method for manufacturing electronic device | Wataru Nihashi, Hideaki Tsubaki, Tomotaka Tsuchimura | 2019-08-27 |
| 10126653 | Pattern forming method and resist composition | Kaoru Iwato, Shohei Kataoka, Shinji Tarutani, Sou Kamimura, Keita Kato +3 more | 2018-11-13 |
| 9709892 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | Shohei Kataoka, Kaoru Iwato, Sou Kamimura, Yuichiro Enomoto, Kana Fujii +3 more | 2017-07-18 |
| 9632410 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device | Shuhei Yamaguchi, Tomotaka Tsuchimura | 2017-04-25 |
| 9563121 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition | Takeshi Inasaki, Takeshi Kawabata, Tomotaka Tsuchimura | 2017-02-07 |
| 9551935 | Pattern forming method and resist composition | Keita Kato, Shinji Tarutani, Sou Kamimura, Yuichiro Enomoto, Kana Fujii +3 more | 2017-01-24 |
| 9417530 | Method for developing resist, method for forming a resist pattern, method for producing a mold, and developing fluid utilized in these methods | Ikuo TAKANO, Tomokazu SEKI | 2016-08-16 |
| 9217919 | Photosensitive composition, pattern-forming method using the composition, and resin used in the composition | Hidenori Takahashi, Tomotaka Tsuchimura, Katsuhiro Yamashita, Naoyuki Nishikawa | 2015-12-22 |
| 8968988 | Resist pattern forming method, resist pattern, crosslinkable negative resist composition, nanoimprint mold and photomask | — | 2015-03-03 |
| 8906600 | Resist pattern forming method, resist pattern, positive resist composition, nanoimprint mold and photomask | Michihiro Shibata | 2014-12-09 |
| 8900791 | Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition | Tomotaka Tsuchimura, Koji Shirakawa, Hideaki Tsubaki | 2014-12-02 |
| 8889339 | Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks | Tadateru Yatsuo, Koutarou Takahashi, Tomotaka Tsuchimura | 2014-11-18 |
| 8852845 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method using the same, and resin | Hidenori Takahashi, Tomotaka Tsuchimura, Katsuhiro Yamashita, Hideaki Tsubaki | 2014-10-07 |
| 8637222 | Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern | Tadateru Yatsuo, Koji Shirakawa, Hideaki Tsubaki, Akira Asano | 2014-01-28 |
| 8546063 | Organic solvent development or multiple development pattern-forming method using electron beams or EUV rays | Hideaki Tsubaki, Koji Shirakawa | 2013-10-01 |
| 8349535 | Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith | Kana Fujii, Takamitsu Tomiga, Kazuyoshi Mizutani, Jiro Yokoyama, Shinichi Sugiyama +2 more | 2013-01-08 |