Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10545405 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device | Shuhei Yamaguchi, Toshiaki Fukuhara, Shuji Hirano | 2020-01-28 |
| 10526266 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, electronic device, compound, and method for producing compound | Natsumi Yokokawa, Hidehiro Mochizuki, Shuhei Yamaguchi | 2020-01-07 |
| 10324374 | Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compound | Shuhei Yamaguchi, Tomotaka Tsuchimura, Natsumi Yokokawa | 2019-06-18 |
| 10139727 | Chemical amplification resist composition, resist film using the same, resist-coated mask blank, method of forming photomask and pattern, and method of manufacturing electronic device and electronic device | Tomotaka Tsuchimura | 2018-11-27 |
| 10120281 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device | Tomotaka Tsuchimura, Shuhei Yamaguchi, Natsumi Yokokawa, Hidehiro Mochizuki | 2018-11-06 |
| 10011576 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound | Shuhei Yamaguchi, Tomotaka Tsuchimura, Natsumi Yokokawa, Hidehiro Mochizuki | 2018-07-03 |
| 9904168 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device | Natsumi Yokokawa, Shuhei Yamaguchi | 2018-02-27 |
| 9316908 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, photomask blank and method of forming pattern | — | 2016-04-19 |
| 9285679 | Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition | Tomotaka Tsuchimura, Takuya TSURUTA, Takeshi Inasaki | 2016-03-15 |
| 8889339 | Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks | Toru Tsuchihashi, Tadateru Yatsuo, Tomotaka Tsuchimura | 2014-11-18 |
| 8735048 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method | Takeshi Inasaki, Takayuki Ito, Tomotaka Tsuchimura, Tadateru Yatsuo | 2014-05-27 |