Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12187025 | On-machine development type planographic printing plate precursor, method for preparing planographic printing plate, and planographic printing method | Kazuaki ENOMOTO, Akinori Fujita, Akira Sakaguchi, Yusuke NAMBA, Ichiro KOYAMA | 2025-01-07 |
| 12157296 | On-press development type lithographic printing plate precursor, method for preparing lithographic printing plate, and lithographic printing method | Kazuaki ENOMOTO, Akinori Fujita, Yusuke NAMBA, Akira Sakaguchi, Akira Yamamoto +1 more | 2024-12-03 |
| 11635701 | Planographic printing plate precursor, method of preparing planographic printing plate, and planographic printing method | Kazuaki ENOMOTO, Akira Sakaguchi | 2023-04-25 |
| 10945928 | Denture base coating composition, coating film-bearing denture base, plate denture, and method for producing coating film-bearing denture base | Yosuke Yamamoto, Akihito Amao, Kiyotaka FUKAGAWA, Yuta SHIGENOI, Chiaki Tsutsumi +2 more | 2021-03-16 |
| 10526266 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, electronic device, compound, and method for producing compound | Hidehiro Mochizuki, Koutarou Takahashi, Shuhei Yamaguchi | 2020-01-07 |
| 10444627 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | Hiroo Takizawa, Toru Fujimori, Wataru Nihashi, Shuji Hirano | 2019-10-15 |
| 10324374 | Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compound | Shuhei Yamaguchi, Tomotaka Tsuchimura, Koutarou Takahashi | 2019-06-18 |
| 10120281 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device | Koutarou Takahashi, Tomotaka Tsuchimura, Shuhei Yamaguchi, Hidehiro Mochizuki | 2018-11-06 |
| 10011576 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound | Shuhei Yamaguchi, Koutarou Takahashi, Tomotaka Tsuchimura, Hidehiro Mochizuki | 2018-07-03 |
| 9904168 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device | Shuhei Yamaguchi, Koutarou Takahashi | 2018-02-27 |
| 9798234 | Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo mask | Tomotaka Tsuchimura, Shuhei Yamaguchi | 2017-10-24 |
| 9766547 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device | Hiroo Takizawa, Shuji Hirano | 2017-09-19 |
| 9651863 | Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | Hiroo Takizawa, Shuji Hirano, Wataru Nihashi | 2017-05-16 |
| 9551933 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device | Hiroo Takizawa, Shuji Hirano, Wataru Nihashi | 2017-01-24 |
| 9527809 | Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device | Hiroo Takizawa, Shuji Hirano, Wataru Nihashi, Hideaki Tsubaki | 2016-12-27 |
| 9500951 | Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device | Hiroo Takizawa, Hideaki Tsubaki | 2016-11-22 |
| 9423690 | Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the same | Hiroo Takizawa, Shuji Hirano, Wataru Nihashi | 2016-08-23 |
| 9291898 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin | Shuji Hirano, Hiroo Takizawa, Wataru Nihashi | 2016-03-22 |
| 9291897 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device | Shuji Hirano, Hiroo Takizawa, Wataru Nihashi | 2016-03-22 |
| 9291896 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic device | Shuji Hirano, Hiroo Takizawa, Wataru Nihashi | 2016-03-22 |
| 9223215 | Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin | Takeshi Kawabata, Hiroo Takizawa, Hideaki Tsubaki, Shuji Hirano | 2015-12-29 |
| 9188865 | Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device | Hiroo Takizawa, Hideaki Tsubaki | 2015-11-17 |