SH

Shuji Hirano

FU Fujifilm: 51 patents #63 of 4,519Top 2%
Overall (All Time): #52,445 of 4,157,543Top 2%
51
Patents All Time

Issued Patents All Time

Showing 1–25 of 51 patents

Patent #TitleCo-InventorsDate
11640113 Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device Hideaki Tsubaki, Hajime Furutani, Akihiro Kaneko, Wataru Nihashi 2023-05-02
11590751 Lithographic printing plate precursor, method for producing lithographic printing plate, polymer particle, and composition Atsuyasu NOZAKI 2023-02-28
11331900 Lithographic printing plate precursor and method for producing lithographic printing plate Ryo Nakamura, Kenjiro ARAKI, Koji Sonokawa, Yuuya MIYAGAWA 2022-05-17
11042094 Treatment liquid and pattern forming method Hideaki Tsubaki, Toru Tsuchihashi, Wataru Nihashi, Kei Yamamoto 2021-06-22
11009791 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device Takamitsu Tomiga, Kenichi Harada, Shinichi Sugiyama, Fumihiro YOSHINO 2021-05-18
10928727 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing 2021-02-23
10551739 Resist composition, and resist film, pattern forming method, and method for manufacturing electronic device, each using resist composition Akira Takada, Naoya SHIMOJU, Toshiya Takahashi, Hidehiro Mochizuki 2020-02-04
10545405 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device Shuhei Yamaguchi, Koutarou Takahashi, Toshiaki Fukuhara 2020-01-28
10488755 Pattern forming method, photo mask manufacturing method, and electronic device manufacturing method Hidehiro Mochizuki, Akira Takada 2019-11-26
10444627 Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device Hiroo Takizawa, Toru Fujimori, Wataru Nihashi, Natsumi Yokokawa 2019-10-15
10423068 Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device 2019-09-24
10031419 Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device Hiroo Takizawa 2018-07-24
9766547 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device Hiroo Takizawa, Natsumi Yokokawa 2017-09-19
9760003 Pattern forming method and actinic-ray- or radiation-sensitive resin composition Kaoru Iwato, Hidenori Takahashi, Sou Kamimura, Keita Kato 2017-09-12
9651863 Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device Hiroo Takizawa, Natsumi Yokokawa, Wataru Nihashi 2017-05-16
9612535 Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device Hiroo Takizawa 2017-04-04
9551933 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device Hiroo Takizawa, Natsumi Yokokawa, Wataru Nihashi 2017-01-24
9527809 Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device Natsumi Yokokawa, Hiroo Takizawa, Wataru Nihashi, Hideaki Tsubaki 2016-12-27
9470980 Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device Naoki Inoue, Hiroo Takizawa, Hideaki Tsubaki 2016-10-18
9423690 Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the same Hiroo Takizawa, Natsumi Yokokawa, Wataru Nihashi 2016-08-23
9323153 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same Hiroo Takizawa, Hideaki Tsubaki 2016-04-26
9323150 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern Hiroo Takizawa, Hideaki Tsubaki 2016-04-26
9291897 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device Natsumi Yokokawa, Hiroo Takizawa, Wataru Nihashi 2016-03-22
9291898 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin Natsumi Yokokawa, Hiroo Takizawa, Wataru Nihashi 2016-03-22
9291896 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic device Natsumi Yokokawa, Hiroo Takizawa, Wataru Nihashi 2016-03-22