Issued Patents All Time
Showing 1–25 of 69 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12306538 | Treatment liquid and pattern forming method | Toru Tsuchihashi, Wataru Nihashi, Kei Yamamoto | 2025-05-20 |
| 11640113 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device | Hajime Furutani, Akihiro Kaneko, Wataru Nihashi, Shuji Hirano | 2023-05-02 |
| 11460769 | Actinic ray-sensitive or radiation-sensitive composition, method for producing actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device | Wataru Nihashi | 2022-10-04 |
| 11156915 | Actinic ray-sensitive or radiation-sensitive composition, method for purifying actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device | Wataru Nihashi | 2021-10-26 |
| 11042094 | Treatment liquid and pattern forming method | Shuji Hirano, Toru Tsuchihashi, Wataru Nihashi, Kei Yamamoto | 2021-06-22 |
| 10962884 | Treatment liquid and pattern forming method | Toru Tsuchihashi, Wataru Nihashi, Kei Yamamoto | 2021-03-30 |
| 10890847 | Pattern forming method, resist pattern, method for manufacturing electronic device, and electronic device | Toru Tsuchihashi, Wataru Nihashi | 2021-01-12 |
| 10788754 | Pattern forming method and electronic device manufacturing method | Wataru Nihashi, Toru Tsuchihashi | 2020-09-29 |
| 10761426 | Pattern forming method, method for manufacturing electronic device, and laminate | Wataru Nihashi, Toru Tsuchihashi, Kei Yamamoto | 2020-09-01 |
| 10663864 | Pattern forming method, method for manufacturing electronic device, and laminate | Wataru Nihashi, Toru Tsuchihashi, Kei Yamamoto | 2020-05-26 |
| 10599038 | Rinsing liquid, pattern forming method, and electronic device manufacturing method | Toru Tsuchihashi, Wataru Nihashi | 2020-03-24 |
| 10562991 | Developer, pattern forming method, and electronic device manufacturing method | Toru Tsuchihashi, Wataru Nihashi | 2020-02-18 |
| 10394127 | Pattern forming method and method for manufacturing electronic device | Wataru Nihashi, Toru Tsuchihashi, Tomotaka Tsuchimura | 2019-08-27 |
| 9568824 | Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith | Toshiya Takahashi, Hiroshi Tamaoki, Hidenori Takahashi | 2017-02-14 |
| 9527809 | Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device | Natsumi Yokokawa, Hiroo Takizawa, Shuji Hirano, Wataru Nihashi | 2016-12-27 |
| 9500951 | Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device | Natsumi Yokokawa, Hiroo Takizawa | 2016-11-22 |
| 9470980 | Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device | Naoki Inoue, Hiroo Takizawa, Shuji Hirano | 2016-10-18 |
| 9465298 | Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method | Shinichi Kanna | 2016-10-11 |
| 9458343 | Method of forming patterns | — | 2016-10-04 |
| 9448477 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, manufacturing method of electronic device using the same, and electronic device | Takeshi Kawabata, Hiroo Takizawa | 2016-09-20 |
| 9411230 | Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device | Hiroo Takizawa, Kaoru Iwato | 2016-08-09 |
| 9323150 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | Shuji Hirano, Hiroo Takizawa | 2016-04-26 |
| 9323153 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same | Shuji Hirano, Hiroo Takizawa | 2016-04-26 |
| 9291904 | Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method | Shinichi Kanna | 2016-03-22 |
| 9223215 | Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin | Natsumi Yokokawa, Takeshi Kawabata, Hiroo Takizawa, Shuji Hirano | 2015-12-29 |