Issued Patents All Time
Showing 26–50 of 69 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9188865 | Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device | Natsumi Yokokawa, Hiroo Takizawa | 2015-11-17 |
| 9188862 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same | Shuji Hirano, Hiroo Takizawa | 2015-11-17 |
| 9176386 | Method of forming patterns | — | 2015-11-03 |
| 9170489 | Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device | Hiroo Takizawa, Shuji Hirano | 2015-10-27 |
| 9152047 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray-or radiation-sensitive film therefrom, method of forming pattern, process for manufacturing semiconductor device, semiconductor device and compound | Takeshi Kawabata, Hiroo Takizawa | 2015-10-06 |
| 9090722 | Chemical amplification resist composition, and mold preparation method and resist film using the same | Toru Fujimori, Koji Shirakawa, Toshihiro Usa, Kenji Sugiyama, Takayuki Ito +3 more | 2015-07-28 |
| 9052590 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | Hidenori Takahashi, Shuji Hirano, Takayuki Ito | 2015-06-09 |
| 9046782 | Resist composition for negative tone development and pattern forming method using the same | — | 2015-06-02 |
| 9005870 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | Hidenori Takahashi, Shuji Hirano | 2015-04-14 |
| 8951718 | Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method | Shinichi Kanna | 2015-02-10 |
| 8900791 | Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition | Tomotaka Tsuchimura, Koji Shirakawa, Toru Tsuchihashi | 2014-12-02 |
| 8895225 | Method of forming patterns | — | 2014-11-25 |
| 8865389 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | Shuji Hirano, Hidenori Takahashi | 2014-10-21 |
| 8852847 | Method of forming patterns | — | 2014-10-07 |
| 8852845 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method using the same, and resin | Hidenori Takahashi, Tomotaka Tsuchimura, Toru Tsuchihashi, Katsuhiro Yamashita | 2014-10-07 |
| 8822129 | Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device | Kaoru Iwato, Shuji Hirano | 2014-09-02 |
| 8642253 | Resist composition for negative tone development and pattern forming method using the same | — | 2014-02-04 |
| 8637220 | Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition | Tomotaka Tsuchimura, Toshiya Takahashi | 2014-01-28 |
| 8637229 | Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method | Shinichi Kanna | 2014-01-28 |
| 8637222 | Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern | Toru Tsuchihashi, Tadateru Yatsuo, Koji Shirakawa, Akira Asano | 2014-01-28 |
| 8632942 | Method of forming patterns | — | 2014-01-21 |
| 8617794 | Method of forming patterns | — | 2013-12-31 |
| 8603727 | Active light ray sensitive or radioactive ray sensitive resin composition, and active light ray sensitive or radioactive ray sensitive film and pattern forming method using the same | Takeshi Kawabata, Hidenori Takahashi, Tomotaka Tsuchimura, Shuji Hirano | 2013-12-10 |
| 8603733 | Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method | Shinji Tarutani, Kazuyoshi Mizutani, Kenji Wada, Wataru HOSHINO | 2013-12-10 |
| 8546063 | Organic solvent development or multiple development pattern-forming method using electron beams or EUV rays | Koji Shirakawa, Toru Tsuchihashi | 2013-10-01 |