Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10007180 | Negative resist composition, resist film using same, pattern forming method, and mask blank provided with resist film | Tomotaka Tsuchimura | 2018-06-26 |
| 9625813 | Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound | Tomotaka Tsuchimura | 2017-04-18 |
| 9034560 | Negative resist composition and pattern forming method using the same | Koji Shirakawa | 2015-05-19 |
| 8889339 | Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks | Toru Tsuchihashi, Koutarou Takahashi, Tomotaka Tsuchimura | 2014-11-18 |
| 8778593 | Chemical amplification resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition | Tomotaka Tsuchimura | 2014-07-15 |
| 8735048 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method | Takeshi Inasaki, Takayuki Ito, Tomotaka Tsuchimura, Koutarou Takahashi | 2014-05-27 |
| 8637222 | Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern | Toru Tsuchihashi, Koji Shirakawa, Hideaki Tsubaki, Akira Asano | 2014-01-28 |