Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11543750 | Lithographic printing plate precursor and method for producing lithographic printing plate | Keisuke NOGOSHI, Kazuaki ENOMOTO | 2023-01-03 |
| 11294279 | Lithographic printing plate precursor, and method for producing lithographic printing plate | Yohei ISHIJI, Keisuke NOGOSHI | 2022-04-05 |
| 11117364 | Color developing composition, lithographic printing plate precursor, method for producing lithographic printing plate, and compound | — | 2021-09-14 |
| 10921712 | Color developing composition, lithographic printing plate precursor, method for producing lithographic printing plate, and color developing compound | Keisuke NOGOSHI, Hiroaki Idei, Akio Mizuno | 2021-02-16 |
| 9826129 | Near-infrared-ray-absorbing composition, near-infrared-ray cut filter using same, manufacturing method therefor, camera module, and manufacturing method therefor | Takashi Kawashima, Seiichi HITOMI, Kouitsu Sasaki | 2017-11-21 |
| 9563121 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition | Takeshi Kawabata, Tomotaka Tsuchimura, Toru Tsuchihashi | 2017-02-07 |
| 9285679 | Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition | Tomotaka Tsuchimura, Takuya TSURUTA, Koutarou Takahashi | 2016-03-15 |
| 9235120 | Negative actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, resist-coated mask blanks, resist pattern forming method, and photomask | Tomotaka Tsuchimura | 2016-01-12 |
| 9235116 | Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | Takeshi Kawabata, Tomotaka Tsuchimura | 2016-01-12 |
| 9223204 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same | Takayuki Ito, Hidenori Takahashi, Tomotaka Tsuchimura, Shohei Kataoka | 2015-12-29 |
| 9091927 | Positive resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition | Tomotaka Tsuchimura | 2015-07-28 |
| 8895222 | Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition | Tomotaka Tsuchimura, Hidenori Takahashi, Takayuki Ito, Shohei Kataoka | 2014-11-25 |
| 8735048 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method | Takayuki Ito, Tomotaka Tsuchimura, Tadateru Yatsuo, Koutarou Takahashi | 2014-05-27 |
| 8673538 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition | Tomotaka Tsuchimura | 2014-03-18 |
| 8614033 | Resist film, resist coated mask blanks and method of forming resist pattern using the resist film, and chemical amplification type resist composition | Tomotaka Tsuchimura, Hiroo Takizawa | 2013-12-24 |
| 8574814 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition | Tomotaka Tsuchimura | 2013-11-05 |
| 8329379 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same | Takayuki Ito, Hidenori Takahashi, Tomotaka Tsuchimura, Shohei Kataoka | 2012-12-11 |