Issued Patents All Time
Showing 25 most recent of 73 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11953829 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Kazunari Yagi, Takashi Kawashima, Hajime Furutani, Michihiro SHIRAKAWA | 2024-04-09 |
| 11656548 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device | Takashi Kawashima, Akihiro Kaneko, Michihiro Ogawa, Michihiro SHIRAKAWA, Hajime Furutani +1 more | 2023-05-23 |
| 11604414 | Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device | Michihiro SHIRAKAWA, Hajime Furutani, Mitsuhiro Fujita, Takashi Kawashima, Michihiro Ogawa +3 more | 2023-03-14 |
| 11604412 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Akihiro Kaneko, Junichi Ito, Takashi Kawashima, Michihiro Ogawa | 2023-03-14 |
| 11467489 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Kazunari Yagi, Takashi Kawashima | 2022-10-11 |
| 10802399 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Ryo Nishio, Masafumi KOJIMA, Akiyoshi GOTO, Michihiro SHIRAKAWA, Keita Kato | 2020-10-13 |
| 10394127 | Pattern forming method and method for manufacturing electronic device | Wataru Nihashi, Hideaki Tsubaki, Toru Tsuchihashi | 2019-08-27 |
| 10324374 | Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compound | Shuhei Yamaguchi, Natsumi Yokokawa, Koutarou Takahashi | 2019-06-18 |
| 10139727 | Chemical amplification resist composition, resist film using the same, resist-coated mask blank, method of forming photomask and pattern, and method of manufacturing electronic device and electronic device | Koutarou Takahashi | 2018-11-27 |
| 10120281 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device | Koutarou Takahashi, Shuhei Yamaguchi, Natsumi Yokokawa, Hidehiro Mochizuki | 2018-11-06 |
| 10011576 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound | Shuhei Yamaguchi, Koutarou Takahashi, Natsumi Yokokawa, Hidehiro Mochizuki | 2018-07-03 |
| 10007180 | Negative resist composition, resist film using same, pattern forming method, and mask blank provided with resist film | Tadateru Yatsuo | 2018-06-26 |
| 9958775 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask | Takuya TSURUTA, Tadeteru Yatsuo | 2018-05-01 |
| 9904167 | Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device | — | 2018-02-27 |
| 9829796 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | Hiroo Takizawa, Takuya TSURUTA | 2017-11-28 |
| 9798234 | Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo mask | Shuhei Yamaguchi, Natsumi Yokokawa | 2017-10-24 |
| 9718901 | Resin composition and pattern forming method using the same | Takuya TSURUTA, Kaoru Iwato | 2017-08-01 |
| 9632410 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device | Shuhei Yamaguchi, Toru Tsuchihashi | 2017-04-25 |
| 9625813 | Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound | Tadateru Yatsuo | 2017-04-18 |
| 9563121 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition | Takeshi Inasaki, Takeshi Kawabata, Toru Tsuchihashi | 2017-02-07 |
| 9557643 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device | Hiroo Takizawa, Takeshi Kawabata, Takuya TSURUTA | 2017-01-31 |
| 9488911 | Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device | Kyouhei Sakita | 2016-11-08 |
| 9400430 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming pattern | Hiroo Takizawa | 2016-07-26 |
| 9285679 | Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition | Takuya TSURUTA, Takeshi Inasaki, Koutarou Takahashi | 2016-03-15 |
| 9235120 | Negative actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, resist-coated mask blanks, resist pattern forming method, and photomask | Takeshi Inasaki | 2016-01-12 |