Issued Patents All Time
Showing 1–25 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12422752 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Akihiro Kaneko, Masafumi KOJIMA, Minoru Uemura, Michihiro SHIRAKAWA | 2025-09-23 |
| 12216404 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Masafumi KOJIMA, Minoru Uemura, Takashi Kawashima, Kei Yamamoto, Kazuhiro Marumo +1 more | 2025-02-04 |
| 12164228 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and resin | Michihiro Ogawa, Takashi Kawashima, Akihiro Kaneko | 2024-12-10 |
| 12044967 | Actinic-ray-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, and method for manufacturing electronic device | Daisuke ASAKAWA, Hironori OKA, Kyohei Sakita, Michihiro SHIRAKAWA | 2024-07-23 |
| 12038689 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Akihiro Kaneko, Kazunari Yagi, Takashi Kawashima | 2024-07-16 |
| 12032288 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Masafumi KOJIMA, Minoru Uemura, Akihiro Kaneko, Kei Yamamoto | 2024-07-09 |
| 12032290 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Daisuke ASAKAWA, Takashi Kawashima, Michihiro SHIRAKAWA, Kei Yamamoto | 2024-07-09 |
| 12007688 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and resin | Daisuke ASAKAWA, Masafumi KOJIMA, Takashi Kawashima, Yasufumi Oishi, Keita Kato | 2024-06-11 |
| 12001140 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Kazunari Yagi, Akihiro Kaneko, Takashi Kawashima | 2024-06-04 |
| 11886113 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Keita Kato, Michihiro SHIRAKAWA, Takashi Kawashima, Masafumi KOJIMA | 2024-01-30 |
| 11584810 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method of manufacturing electronic device, compound, and resin | Akira Takada, Ryo Nishio, Michihiro SHIRAKAWA, Naohiro TANGO, Kazuhiro Marumo +1 more | 2023-02-21 |
| 11579528 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Ryo Nishio, Akira Takada, Naohiro TANGO, Kazuhiro Marumo, Keiyu O | 2023-02-14 |
| 11281103 | Composition for forming upper layer film, pattern forming method, resist pattern, and method for manufacturing electronic device | Naoya HATAKEYAMA, Naoki Inoue, Naohiro TANGO, Michihiro SHIRAKAWA | 2022-03-22 |
| 11249395 | Pattern forming method, method for manufacturing electronic device, laminate film, and composition for forming upper layer film | Naoki Inoue, Naohiro TANGO, Michihiro SHIRAKAWA | 2022-02-15 |
| 11156917 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Kyohei Sakita, Mitsuhiro Fujita, Takumi Tanaka, Keishi YAMAMOTO, Keita Kato | 2021-10-26 |
| 11150557 | Pattern forming method, method for manufacturing electronic device, monomer for producing resin for semiconductor device manufacturing process, resin, method for producing resin, actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film | Naoya HATAKEYAMA, Yasunori Yonekuta | 2021-10-19 |
| 11073762 | Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator | Daisuke ASAKAWA, Masafumi KOJIMA, Keita Kato, Keiyu OU, Kyohei Sakita | 2021-07-27 |
| 11067890 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Masafumi KOJIMA, Akira Takada, Keita Kato, Kyohei Sakita | 2021-07-20 |
| 10859914 | Pattern forming method, method for producing electronic device, and actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development | Naoya HATAKEYAMA, Michihiro SHIRAKAWA, Keita Kato, Keiyu OU | 2020-12-08 |
| 10852637 | Pattern forming method, resist pattern, method for manufacturing electronic device, and composition for forming upper layer film | Naoki Inoue, Naohiro TANGO, Kei Yamamoto, Michihiro SHIRAKAWA | 2020-12-01 |
| 10802399 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Ryo Nishio, Masafumi KOJIMA, Tomotaka Tsuchimura, Michihiro SHIRAKAWA, Keita Kato | 2020-10-13 |
| 10578968 | Pattern forming method, resist pattern, and process for producing electronic device | Kei Yamamoto, Naohiro TANGO, Naoki Inoue, Michihiro SHIRAKAWA | 2020-03-03 |
| 10303058 | Pattern forming method, treating agent, electronic device, and method for manufacturing the same | Hajime Furutani, Michihiro SHIRAKAWA, Masafumi KOJIMA | 2019-05-28 |
| 10261417 | Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film and pattern forming method, each using composition, and method for manufacturing electronic device | Michihiro SHIRAKAWA, Keita Kato, Fumihiro YOSHINO, Kei Yamamoto | 2019-04-16 |
| 10234759 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern | Takeshi Kawabata, Hiroo Takizawa, Akinori Shibuya, Masafumi KOJIMA, Keita Kato | 2019-03-19 |