Issued Patents All Time
Showing 1–25 of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12422752 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Akihiro Kaneko, Masafumi KOJIMA, Minoru Uemura, Akiyoshi GOTO | 2025-09-23 |
| 12044967 | Actinic-ray-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, and method for manufacturing electronic device | Daisuke ASAKAWA, Hironori OKA, Kyohei Sakita, Akiyoshi GOTO | 2024-07-23 |
| 12032290 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Daisuke ASAKAWA, Takashi Kawashima, Akiyoshi GOTO, Kei Yamamoto | 2024-07-09 |
| 11953829 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Kazunari Yagi, Takashi Kawashima, Tomotaka Tsuchimura, Hajime Furutani | 2024-04-09 |
| 11886113 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Keita Kato, Akiyoshi GOTO, Takashi Kawashima, Masafumi KOJIMA | 2024-01-30 |
| 11703758 | Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device | Hajime Furutani, Hironori OKA | 2023-07-18 |
| 11656548 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device | Tomotaka Tsuchimura, Takashi Kawashima, Akihiro Kaneko, Michihiro Ogawa, Hajime Furutani +1 more | 2023-05-23 |
| 11604414 | Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device | Hajime Furutani, Mitsuhiro Fujita, Tomotaka Tsuchimura, Takashi Kawashima, Michihiro Ogawa +3 more | 2023-03-14 |
| 11584810 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method of manufacturing electronic device, compound, and resin | Akira Takada, Ryo Nishio, Akiyoshi GOTO, Naohiro TANGO, Kazuhiro Marumo +1 more | 2023-02-21 |
| 11573491 | Negative tone photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device | Wataru Nihashi, Michihiro Ogawa | 2023-02-07 |
| 11453734 | Treatment liquid and pattern forming method | Tetsuya KAMIMURA, Tadashi OOMATSU | 2022-09-27 |
| 11281103 | Composition for forming upper layer film, pattern forming method, resist pattern, and method for manufacturing electronic device | Naoya HATAKEYAMA, Naoki Inoue, Naohiro TANGO, Akiyoshi GOTO | 2022-03-22 |
| 11249395 | Pattern forming method, method for manufacturing electronic device, laminate film, and composition for forming upper layer film | Naoki Inoue, Naohiro TANGO, Akiyoshi GOTO | 2022-02-15 |
| 10859914 | Pattern forming method, method for producing electronic device, and actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development | Naoya HATAKEYAMA, Akiyoshi GOTO, Keita Kato, Keiyu OU | 2020-12-08 |
| 10852637 | Pattern forming method, resist pattern, method for manufacturing electronic device, and composition for forming upper layer film | Naoki Inoue, Naohiro TANGO, Kei Yamamoto, Akiyoshi GOTO | 2020-12-01 |
| 10802399 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Ryo Nishio, Masafumi KOJIMA, Akiyoshi GOTO, Tomotaka Tsuchimura, Keita Kato | 2020-10-13 |
| 10578968 | Pattern forming method, resist pattern, and process for producing electronic device | Kei Yamamoto, Naohiro TANGO, Naoki Inoue, Akiyoshi GOTO | 2020-03-03 |
| 10303058 | Pattern forming method, treating agent, electronic device, and method for manufacturing the same | Hajime Furutani, Akiyoshi GOTO, Masafumi KOJIMA | 2019-05-28 |
| 10261417 | Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film and pattern forming method, each using composition, and method for manufacturing electronic device | Akiyoshi GOTO, Keita Kato, Fumihiro YOSHINO, Kei Yamamoto | 2019-04-16 |
| 10175578 | Pattern forming method, composition for forming protective film, method for manufacturing electronic device, and electronic device | Naoki Inoue, Naohiro TANGO, Kei Yamamoto, Akiyoshi GOTO | 2019-01-08 |
| 10114292 | Pattern forming method, resist pattern, and method for manufacturing electronic device | Naoki Inoue, Naohiro TANGO, Kei Yamamoto, Akiyoshi GOTO | 2018-10-30 |
| 10025186 | Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device | Akiyoshi GOTO, Masafumi KOJIMA, Keita Kato, Keiyu OU | 2018-07-17 |
| 10018913 | Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device | Akiyoshi GOTO, Masafumi KOJIMA, Keita Kato | 2018-07-10 |
| 9996003 | Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device | Akiyoshi GOTO, Masafumi KOJIMA, Keita Kato | 2018-06-12 |
| 9952509 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing electronic device, and electronic device | Keita Kato, Keiyu OU, Akiyoshi GOTO, Masafumi KOJIMA | 2018-04-24 |