Issued Patents All Time
Showing 26–43 of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9810981 | Pattern formation method, etching method, electronic device manufacturing method, and electronic device | Ryosuke Ueba, Naoya IGUCHI, Tsukasa Yamanaka, Naohiro TANGO, Keita Kato | 2017-11-07 |
| 9791777 | Active light sensitive or radiation sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device | Akiyoshi GOTO, Masafumi KOJIMA, Keita Kato, Keiyu OU | 2017-10-17 |
| 9551931 | Method of forming pattern, actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, process for manufacturing electronic device and electronic device | Junichi Ito, Akinori Shibuya, Akiyoshi GOTO, Kei Yamamoto, Fumihiro YOSHINO | 2017-01-24 |
| 9523912 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound | Shohei Kataoka, Akinori Shibuya, Toshiaki Fukuhara, Hajime Furutani | 2016-12-20 |
| 9523913 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | Keita Kato, Hidenori Takahashi, Shoichi SAITOH, Fumihiro YOSHINO | 2016-12-20 |
| 9482947 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device | Shuhei Yamaguchi, Hidenori Takahashi, Shohei Kataoka, Shoichi SAITOH, Fumihiro YOSHINO | 2016-11-01 |
| 9423689 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device | Shuhei Yamaguchi, Hidenori Takahashi, Fumihiro YOSHINO | 2016-08-23 |
| 9417528 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | Keita Kato, Tadahiro ODANI, Atsushi Nakamura, Hidenori Takahashi, Kaoru Iwato | 2016-08-16 |
| 9316910 | Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film | Shohei Kataoka, Hidenori Takahashi, Shuhei Yamaguchi, Shoichi SAITOH, Fumihiro YOSHINO | 2016-04-19 |
| 9250532 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | Keita Kato, Tadahiro ODANI, Atsushi Nakamura, Hidenori Takahashi, Kaoru Iwato | 2016-02-02 |
| 9140981 | Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film using the same, pattern forming method, electronic device manufacturing method, and electronic device, each using the same | Kaoru Iwato, Hidenori Takahashi | 2015-09-22 |
| 9128376 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | Keita Kato, Hidenori Takahashi, Sou Kamimura | 2015-09-08 |
| 9120288 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for preparing electronic device, and electronic device | Hidenori Takahashi, Shuhei Yamaguchi, Shohei Kataoka, Fumihiro YOSHINO, Shoichi SAITOH | 2015-09-01 |
| 9086627 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, manufacturing method of electronic device, and electronic device | Keita Kato, Tadahiro ODANI, Atsushi Nakamura, Hidenori Takahashi, Kaoru Iwato | 2015-07-21 |
| 9075310 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | Keita Kato, Tadahiro ODANI, Atsushi Nakamura, Hidenori Takahashi, Kaoru Iwato | 2015-07-07 |
| 9046773 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound | Shuhei Yamaguchi, Yuko Yoshida, Akinori Shibuya | 2015-06-02 |
| 9046766 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same | Takayuki Kato, Hyou Takahashi | 2015-06-02 |
| 8846290 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | Naohiro TANGO, Mitsuhiro Fujita, Shuhei Yamaguchi, Akinori Shibuya, Shohei Kataoka | 2014-09-30 |