Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10859482 | Organic residue inspecting method and liquid discharge head producing method | Yohei Hamade, Ken Ikegame | 2020-12-08 |
| 9707757 | Photosensitive negative resin composition | — | 2017-07-18 |
| 9707759 | Liquid-ejecting head and method of manufacturing the liquid-ejecting head | Kazunari Ishizuka, Yohei Hamade, Ken Ikegame, Satoshi Tsutsui | 2017-07-18 |
| 9268222 | Photosensitive negative resin composition, fine structure, production process of fine structure and liquid ejection head | Kyosuke Nagaoka, Masako Shimomura | 2016-02-23 |
| 9052594 | Positive photosensitive composition and method of forming pattern using the same | Naoya Sugimoto, Kunihiko Kodama, Kei Yamamoto | 2015-06-09 |
| 9046766 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same | Takayuki Kato, Michihiro SHIRAKAWA | 2015-06-02 |
| 8975003 | Photosensitive negative resin composition | Masako Shimomura, Ken Ikegame | 2015-03-10 |
| 8936350 | Print head and inkjet printing apparatus | Yasunori Takei, Kenji Yabe, Takuma Kodoi, Ken Ikegame, Isamu Horiuchi | 2015-01-20 |
| 8785110 | Liquid ejection head and method of manufacturing the same | Takuma Kodoi, Yasunori Takei, Kenji Yabe, Isamu Horiuchi, Ken Ikegame | 2014-07-22 |
| 8080361 | Positive photosensitive composition and method of forming pattern using the same | Naoya Sugimoto, Kunihiko Kodama, Kei Yamamoto | 2011-12-20 |
| 7914965 | Resist composition and method of pattern formation with the same | Kenji Wada | 2011-03-29 |
| 7521168 | Resist composition for electron beam, EUV or X-ray | Kazuyoshi Mizutani | 2009-04-21 |
| 7425404 | Chemical amplification resist composition and pattern-forming method using the same | Shinji Tarutani, Kenji Wada | 2008-09-16 |
| 7326516 | Resist composition for immersion exposure and pattern formation method using the same | Fumiyuki Nishiyama | 2008-02-05 |
| 7285369 | Positive resist composition and pattern formation method using the same | — | 2007-10-23 |
| 7241551 | Positive-working resist composition | Tsukasa Yamanaka, Toru Fujimori | 2007-07-10 |
| 7105273 | Positive resist composition | Shoichiro Yasunami, Kazuyoshi Mizutani | 2006-09-12 |
| 7094515 | Stimulus sensitive compound and stimulus sensitive composition containing the same | Kunihiko Kodama | 2006-08-22 |
| 7083892 | Resist composition | Shoichiro Yasunami, Kazuyoshi Mizutani | 2006-08-01 |
| 6902862 | Resist composition | Kazuyoshi Mizutani, Shoichiro Yasunami | 2005-06-07 |