Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11429018 | Method of manufacturing chemical fluid for manufacturing electronic material, pattern forming method, method of manufacturing semiconductor device, chemical fluid for manufacturing electronic material, container, and quality inspection method | Tetsuya Shimizu, Yukihisa Kawada | 2022-08-30 |
| 10705428 | Organic processing liquid for patterning chemical amplification resist film, container for organic processing liquid for patterning chemical amplification resist film, and pattern forming method, method of manufacturing electronic device, and electronic device using the same | Takashi Kawamoto | 2020-07-07 |
| 10126651 | Pattern forming method, and, method for producing electronic device and electronic device, each using the same | Shinichi Sugiyama, Ryosuke Ueba, Makoto Momota | 2018-11-13 |
| 10088752 | Method for manufacturing organic processing fluid for patterning of chemical amplification type resist film, organic processing fluid for patterning of chemical amplification type resist film, pattern forming method, method for manufacturing electronic device, and electronic device | Takashi Kawamoto, Naoya IGUCHI | 2018-10-02 |
| 9885956 | Pattern forming method, and, electronic device producing method and electronic device, each using the same | Naoya IGUCHI, Ryosuke Ueba, Kei Yamamoto | 2018-02-06 |
| 9810981 | Pattern formation method, etching method, electronic device manufacturing method, and electronic device | Ryosuke Ueba, Naoya IGUCHI, Naohiro TANGO, Michihiro SHIRAKAWA, Keita Kato | 2017-11-07 |
| 8530003 | Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor device | Kenichiro Sato | 2013-09-10 |
| 8287709 | Method and device for immersion treatment of vehicle | Yusuke Hagihara, Masaki Takahashi, Makoto Takayanagi, Hideki Ikeda, Naoya Kanke +1 more | 2012-10-16 |
| 8133550 | Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor device | Kenichiro Sato | 2012-03-13 |
| 7749678 | Photosensitive composition and pattern forming method using the same | — | 2010-07-06 |
| 7615331 | Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device | Kenichiro Sato | 2009-11-10 |
| 7371501 | Photosensitive resin composition and method for manufacturing semiconductor apparatus using the same | Kenichiro Sato | 2008-05-13 |
| 7368216 | Photosensitive resin composition and manufacturing method of semiconductor device using the same | Kenichiro Sato | 2008-05-06 |
| 7348122 | Photosensitive resin composition and method for manufacturing semiconductor device using the same | Kenichiro Sato | 2008-03-25 |
| 7252924 | Positive resist composition and method of pattern formation using the same | Kenichiro Sato | 2007-08-07 |
| 7241551 | Positive-working resist composition | Hyou Takahashi, Toru Fujimori | 2007-07-10 |
| 6200729 | Positive photosensitive composition | Toshiaki Aoai, Kunihiko Kodama, Kazuya Uenishi | 2001-03-13 |
| 6013411 | Positive working photosensitive composition | Toshiaki Aoai, Toru Fujimori, Kazuya Uenishi | 2000-01-11 |
| 6010820 | Positive photosensitive composition | Toshiaki Aoai, Kunihiko Kodama, Kazuya Uenishi | 2000-01-04 |
| 5939234 | Chemically amplified positive resist composition | Toshiaki Aoai, Toru Fujimori | 1999-08-17 |
| 5837420 | Positive working photosensitive composition | Toshiaki Aoai, Kunihiko Kodama, Kazuya Uenishi | 1998-11-17 |
| 5824451 | Positive photosensitive composition | Toshiaki Aoai | 1998-10-20 |
| 5707776 | Positive resin composition sensitive to ultraviolet rays | Yasumasa Kawabe, Toshiaki Aoai | 1998-01-13 |
| 5698369 | Photosensitive composition comprising a sulfonimide compound according to the formula R.sub.1 -SO.sub.2 -NR.sub.3 -SO.sub.2 -R.sub.2 wherein R.sub.1, R.sub.2 and R.sub.3 each represents an aromatic group or an alkyl group | Koichi Kawamura, Fumikazu Kobayashi | 1997-12-16 |
| 5683856 | Positive-working photosensitive composition | Toshiaki Aoai, Kazuya Uenishi | 1997-11-04 |