Issued Patents All Time
Showing 1–25 of 48 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11566118 | Nanofiber dispersion, method of producing nanofiber dispersion, powdery nanofibers obtainable from the dispersion, resin composition containing the powdery nanofibers ad molding material for 3D printer using the resin composition | Masato Fujihashi, Mayumi Mochida, Toru Horiuchi | 2023-01-31 |
| 10289001 | Pattern forming method, etching method and method for producing capacitance-type input device | Hideaki Ito, Shinji Fujimoto | 2019-05-14 |
| 10133175 | Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging device | Daisuke Kashiwagi, Takeshi Andou, Satoru Yamada, Hisamitsu Tomeba | 2018-11-20 |
| 9810984 | Photosensitive transfer material, pattern formation method, and etching method | Hideaki Ito, Shinji Fujimoto | 2017-11-07 |
| 9599901 | Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging device | Daisuke Kashiwagi, Takeshi Andou, Satoru Yamada, Hisamitsu Tomeba | 2017-03-21 |
| 8728716 | Resin pattern, method for producing the pattern, method for producing MEMS structure, method for manufacturing semiconductor device, and method for producing plated pattern | Takeshi Andou, Junichi Fujimori, Hiroyuki Yonezawa, Hideyuki Nakamura | 2014-05-20 |
| 7255971 | Positive resist composition | Toru Fujimori | 2007-08-14 |
| 7214465 | Positive photosensitive composition | Hajime Nakao, Toru Fujimori, Kunihiko Kodama | 2007-05-08 |
| 6846610 | Positive photosensitive resin composition | Kenichiro Sato, Toshiaki Aoai | 2005-01-25 |
| 6806022 | Positive photosensitive resin composition | Kenichiro Sato, Toshiaki Aoai | 2004-10-19 |
| 6743562 | Positive photoresist composition | Mokoto Momota | 2004-06-01 |
| 6699635 | Positive photosensitive composition | Kunihiko Kodama, Kenichiro Sato, Toshiaki Aoai | 2004-03-02 |
| 6692897 | Positive resist composition | Toru Fujimori, Hajime Nakao | 2004-02-17 |
| 6596458 | Positive-working photoresist composition | Kenichiro Sato, Kunihiko Kodama, Toshiaki Aoai | 2003-07-22 |
| 6376152 | Positive photoresist composition | Shinichi Kanna, Fumiyuki Nishiyama | 2002-04-23 |
| 6159656 | Positive photosensitive resin | Kenichiro Sato, Toshiaki Aoai | 2000-12-12 |
| 5948587 | Positive working photoresist composition | Shiro Tan | 1999-09-07 |
| 5709977 | Positive working photoresist composition | Shiro Tan | 1998-01-20 |
| 5707776 | Positive resin composition sensitive to ultraviolet rays | Tsukasa Yamanaka, Toshiaki Aoai | 1998-01-13 |
| 5674657 | Positive-working photoresist compositions comprising an alkali-soluble novolak resin made with four phenolic monomers | Shiro Tan, Kenji Honda | 1997-10-07 |
| 5652081 | Positive working photoresist composition | Shiro Tan, Shinji Sakaguchi | 1997-07-29 |
| 5629128 | Positive photoresist composition | Koji Shirakawa, Kenichiro Sato, Kunihiko Kodama, Shinji Sakaguchi | 1997-05-13 |
| 5620828 | Positive photoresist composition containing quinonediazide esterification product, novolak resin and pocyhydroxy alkali dissolution accelerator | Shiro Tan | 1997-04-15 |
| 5609982 | Positive-working photoresist composition | Kenichiro Sato, Toshiaki Aoai, Shinji Sakaguchi | 1997-03-11 |
| 5576139 | Positive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalyst | Kazuya Uenishi, Shiro Tan, Tadayoshi Kokubo | 1996-11-19 |