Issued Patents All Time
Showing 26–48 of 48 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5554481 | Positive working photoresist composition | Kenichiro Satoh, Toshiaki Aoai | 1996-09-10 |
| 5534382 | Positive photoresist composition | Kenichiro Sato | 1996-07-09 |
| 5529881 | Postive photoresist composition | Kenichiro Sato, Toshiaki Aoai, Kazuya Uenishi | 1996-06-25 |
| 5523396 | Process for synthesizing quinonediazide ester utilizing base catalyst | Kenichiro Sato, Toshiaki Aoai | 1996-06-04 |
| 5494773 | Positive photoresist composition comprising a novolak resin having a cycloalkylidene-bisphenol group | Shiro Tan, Tadayoshi Kokubo | 1996-02-27 |
| 5429905 | Positive working photoresist composition containing naphthoquinone diazide sulfonic acid ester of polyhydroxy compound | Shiro Tan, Tadayoshi Kokubo | 1995-07-04 |
| 5360692 | Positive type 1,2-naphthoquinonediazide photoresist composition containing benzotriazole light absorbing agent | Kazuya Uenishi, Tadayoshi Kokubo | 1994-11-01 |
| 5340683 | Presensitized plate having surface-grained and anodized aluminum substrate with light-sensitive layer containing quinone diazide sulfonic acid ester of particular polyhydroxy compound | Syunichi Kondo, Akira Nagashima | 1994-08-23 |
| 5340688 | Positive type photoresist composition | Toshiaki Aoai, Tadayoshi Kokubo | 1994-08-23 |
| 5324619 | Positive quinone diazide photoresist composition containing select polyhydroxy additive | Kazuya Uenishi, Tadayoshi Kokubo | 1994-06-28 |
| 5324618 | Positive type quinonediazide photoresist composition containing select tetraphenolic additive | Shiro Tan, Tadayoshi Kokubo | 1994-06-28 |
| 5318875 | Positive quinonediazide photoresist composition containing select hydroxyphenol additive | Toshiaki Aoai, Tadayoshi Kokubo, Shiro Tan | 1994-06-07 |
| 5290658 | Positive type photoresist composition comprising polyaromatic hydroxy quinone diazide esters as the photosensitive ingredient | Kazuya Uenishi, Tadayoshi Kokubo | 1994-03-01 |
| 5153096 | Positive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazide | Kazuya Uenishi, Tadayoshi Kokubo | 1992-10-06 |
| 5130224 | Positive-working photoresist composition | Tadayoshi Kokubo | 1992-07-14 |
| 5089373 | Positive photoresist composition utilizing O-quinonediazide and novolak resin | Kazuya Uenishi, Tadayoshi Kokubo | 1992-02-18 |
| 5030550 | Developer for positive type photoresists | Hiroshi Matsumoto, Tadayoshi Kokubo | 1991-07-09 |
| 4894311 | Positive-working photoresist composition | Kazuya Uenishi, Tadayoshi Kokubo | 1990-01-16 |
| 4871645 | Positive-working photoresist composition | Kazuya Uenishi, Tadayoshi Kokubo | 1989-10-03 |
| 4863828 | Positive-working o-quinone diazide photoresist composition | Kazuya Uenishi, Tadayoshi Kokubo | 1989-09-05 |
| 4244690 | Method of dyeing fibrous products | Kanji Sato, Kazuyoshi Kushibe, Masaru Nishii, Yasuhiro Kanaya | 1981-01-13 |
| 4240791 | Dyeing method for fibrous products | Kanji Sato, Kazuyoshi Kushibe, Masaru Nishii, Yasuhiro Kanaya | 1980-12-23 |
| 4197256 | Method of stabilizing an alkaline aqueous solution of thiourea dioxide | Kanji Sato, Kazuyoshi Kushibe, Masaru Nishii, Yasuhiro Kanaya | 1980-04-08 |