KK

Kunihiko Kodama

FU Fujifilm: 64 patents #37 of 4,519Top 1%
Fujitsu Limited: 55 patents #216 of 24,456Top 1%
KT Kabushiki Kaisha Toshiba: 10 patents #3,082 of 21,451Top 15%
CC Ciba Specialty Chemicals: 6 patents #203 of 1,233Top 20%
📍 Uda, JP: #1 of 117 inventorsTop 1%
Overall (All Time): #7,758 of 4,157,543Top 1%
135
Patents All Time

Issued Patents All Time

Showing 1–25 of 135 patents

Patent #TitleCo-InventorsDate
11926740 Resin composition, film, optical filter, image display device, solid-state imaging element, and compound Daisuke Sasaki, Akihiro Hara, Nobutaka Fukagawa, Yu Naito, Hiroki KUWAHARA 2024-03-12
10889778 Manufacturing method of lubricant composition and lubricant composition Yuta SHIGENOI 2021-01-12
10312546 Non-aqueous liquid electrolyte for secondary battery and secondary battery 2019-06-04
9976100 Lubricant composition 2018-05-22
9941543 Non-aqueous liquid electrolyte for secondary battery and secondary battery Yoshinori Kanazawa 2018-04-10
9905886 Non-aqueous liquid electrolyte for secondary battery and secondary battery Michio Ono, Ikuo Kinoshita 2018-02-27
9868846 Curable composition for imprints, patterning method and pattern Yuichiro Enomoto, Kazuyuki Usuki, Tadashi Omatsu, Hirotaka KITAGAWA 2018-01-16
9684233 Curable composition for imprints, patterning method and pattern 2017-06-20
9663671 Curable composition for imprints and method of storing the same Yuichiro Enomoto, Shinji Tarutani 2017-05-30
9507263 Underlay film composition for imprints and method of forming pattern and pattern formation method using the same Shinji Tarutani, Yuichiro Enomoto, Tadashi OOMATSU, Takayuki Ito, Hirotaka KITAGAWA +1 more 2016-11-29
9482950 Curable composition for imprints, pattern-forming method and pattern Yuichiro Goto 2016-11-01
9441065 Curable composition for imprints, cured product and method for manufacturing a cured product Kyouhei Sakita, Hiroyuki Yonezawa 2016-09-13
9335628 Curable composition for imprints, patterning method and pattern 2016-05-10
9052594 Positive photosensitive composition and method of forming pattern using the same Hyou Takahashi, Naoya Sugimoto, Kei Yamamoto 2015-06-09
8999221 Curable composition for imprints, patterning method and pattern Kyouhei Sakita, Hiroyuki Yonezawa 2015-04-07
8980404 Composition for imprints, pattern and patterning method 2015-03-17
8933144 Curable composition for imprint, pattern-forming method and pattern Yuichiro Enomoto, Shinji Tarutani 2015-01-13
8894187 Liquid application device, liquid application method, and nanoimprint system Kenichi Kodama, Tadashi Omatsu, Satoshi Wakamatsu 2014-11-25
8883065 Curable composition for imprints, patterning method and pattern Kyouhei Sakita, Hiroyuki Yonezawa 2014-11-11
8877828 Method for producing curable composition for imprints Yuichiro Enomoto, Shinji Tarutani 2014-11-04
8859071 Curable composition for imprint, patterning method and pattern 2014-10-14
8851624 Maintenance liquid Kenichi Kodama 2014-10-07
8820541 Method for producing curable composition for imprints Yuichiro Enomoto, Shinji Tarutani 2014-09-02
8808975 Positive resist composition for immersion exposure and pattern-forming method using the same Haruki Inabe, Hiromi Kanda 2014-08-19
8783823 Maintenance liquid Kenichi Kodama 2014-07-22