KK

Kunihiko Kodama

FU Fujifilm: 64 patents #37 of 4,519Top 1%
Fujitsu Limited: 55 patents #216 of 24,456Top 1%
KT Kabushiki Kaisha Toshiba: 10 patents #3,082 of 21,451Top 15%
CC Ciba Specialty Chemicals: 6 patents #203 of 1,233Top 20%
📍 Uda, JP: #1 of 117 inventorsTop 1%
Overall (All Time): #7,758 of 4,157,543Top 1%
135
Patents All Time

Issued Patents All Time

Showing 51–75 of 135 patents

Patent #TitleCo-InventorsDate
7632623 Positive resist composition and pattern formation method using the positive resist composition Kaoru Iwato, Yuko Yoshida, Kei Yamamoto 2009-12-15
7625690 Positive resist composition and pattern forming method using the same Kazuyoshi Mizutani, Kaoru Iwato, Masaomi Makino, Toru Tsuchihashi 2009-12-01
7510822 Stimulation sensitive composition and compound 2009-03-31
7505388 Laser controller for a multi-intensity recording laser and an optical disk drive including the same Takashi Inoue 2009-03-17
7465528 Positive-working photosensitive composition and pattern forming method using the same Fumiyuki Nishiyama 2008-12-16
7449573 Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition Kenji Wada, Kaoru Iwato 2008-11-11
7442490 Positive resist composition and pattern formation method using the positive resist composition Kaoru Iwato 2008-10-28
7435526 Positive photosensitive composition Toshiaki Aoai 2008-10-14
7371505 Photosensitive composition and method for forming pattern using the same 2008-05-13
7351515 Positive resist composition and pattern-forming method using the same Shoichiro Yasunami, Kenji Wada, Kenichiro Sato 2008-04-01
7341817 Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition Kenji Wada 2008-03-11
7335454 Positive resist composition Shinichi Kanna, Kazuyoshi Mizutani, Tomoya Sasaki 2008-02-26
7323286 Photosensitive composition, compound used in the same, and patterning method using the same 2008-01-29
7273690 Positive resist composition for immersion exposure and method of pattern formation with the same Hiromi Kanda 2007-09-25
7245568 Disk recording and reproducing device Akira Hikimura, Tomoe Nishimura 2007-07-17
7214465 Positive photosensitive composition Hajime Nakao, Yasumasa Kawabe, Toru Fujimori 2007-05-08
7202014 Stimulus-sensitive composition, compound and pattern formation method using the stimulation-sensitive composition 2007-04-10
7192685 Positive resist composition and method of forming resist pattern using the same. 2007-03-20
7189492 Photosensitive composition and pattern forming method using the same Kenji Wada, Kenichiro Satoh 2007-03-13
7122589 Positive resist composition and pattern formation method using the same Fumiyuki Nishiyama, Kenichiro Sato 2006-10-17
7094515 Stimulus sensitive compound and stimulus sensitive composition containing the same Hyou Takahashi 2006-08-22
7090960 Negative resist composition Shoichiro Yasunami 2006-08-15
7074544 Image recording material Kotaro Watanabe, Kazuto Kunita 2006-07-11
7033727 Photosensitive composition and acid generator 2006-04-25
7022459 Photosensitive composition 2006-04-04