HK

Hiromi Kanda

FU Fujifilm: 44 patents #90 of 4,519Top 2%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
📍 Nanbu, JP: #24 of 1,154 inventorsTop 3%
Overall (All Time): #65,546 of 4,157,543Top 2%
45
Patents All Time

Issued Patents All Time

Showing 1–25 of 45 patents

Patent #TitleCo-InventorsDate
10678132 Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin 2020-06-09
9709891 Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition Shinichi Kanna 2017-07-18
9541831 Positive resist composition and method of pattern formation with the same Shinichi Kanna, Haruki Inabe 2017-01-10
9442372 Pigment dispersion composition, photocurable composition and color filter 2016-09-13
9081279 Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition Shinichi Kanna 2015-07-14
9057952 Positive resist composition and method of pattern formation with the same Shinichi Kanna, Haruki Inabe 2015-06-16
9023576 Positive resist composition for immersion exposure and pattern-forming method using the same Haruki Inabe, Shinichi Kanna 2015-05-05
8945810 Positive resist composition and pattern-forming method Fumiyuki Nishiyama 2015-02-03
8871421 Positive resist composition and method of pattern formation with the same Schinichi Kanna, Haruki Inabe 2014-10-28
8808975 Positive resist composition for immersion exposure and pattern-forming method using the same Haruki Inabe, Kunihiko Kodama 2014-08-19
8741537 Positive resist composition and pattern-forming method using the same 2014-06-03
8697329 Positive resist composition and pattern forming method using the same Shinichi Kanna 2014-04-15
8679724 Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition Shinichi Kanna 2014-03-25
8426101 Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition Kenji Wada 2013-04-23
8426109 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same Haruki Inabe 2013-04-23
8389200 Pattern forming method Shinichi Kanna, Haruki Inabe 2013-03-05
8362140 Pigment-dispersed composition, colored photosensitive composition, photocurable composition, color filter, liquid crystal display device, and solid-state image pickup device Kazuhiro Fujimaki, Koichi Sugihara, Shigekazu Suzuki 2013-01-29
8343708 Positive resist composition and pattern forming method Toshiaki Fukuhara, Shinichi Kanna 2013-01-01
8241833 Positive resist composition and pattern-forming method using the same Fumiyuki Nishiyama 2012-08-14
8080363 Resin for hydrophobitizing resist surface, method for manufacturing the resin, and positive resist composition containing the resin 2011-12-20
8039197 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same Haruki Inabe 2011-10-18
8034537 Positive resist composition and pattern forming method Toshiaki Fukuhara, Shinichi Kanna 2011-10-11
7998654 Positive resist composition and pattern-forming method Fumiyuki Nishiyama 2011-08-16
7947421 Positive resist composition for immersion exposure and pattern-forming method using the same 2011-05-24
7906268 Positive resist composition for immersion exposure and pattern-forming method using the same Haruki Inabe, Shinichi Kanna 2011-03-15